We will present our recent advances in identifying, understanding, and suppressing ns laser damage precursors in IBS produced dielectric films under UV, pulsed laser exposure. Model systems of single layer, layer pairs, and MLD coatings of silica, hafnia, scandia, and alumina were investigated. Through materials characterization, laser damage testing and simulations, we revealed that entrapped nanobubbles were important low fluence laser damage precursors. We further demonstrated that the identified precursors could be suppressed by either post low pressure thermal annealing or the manipulation of deposition process including using different sputtering gases to achieve ns UV-laser damage resistant dielectric coatings.
We compare the 355 nm, 45º AOI p-pol 8 n-s laser damage performance of standing-wave hafnia single layers fabricated using argon and xenon as working gas. A suite of metrology tools has been employed to understand the structural, chemical and paramagnetic defect states in the two films. The resultant films from the xenon deposition process are highly dense and have high 3w laser damage performance.
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