Extreme ultraviolet laser ablation mass spectrometry (EUV LA-MS), developed at Colorado State University, uses EUV laser wavelengths instead of traditional visible lasers, allowing sub-micron ablation spot sizes while maintaining a good sensitivity for trace element analysis. In this paper, we have explored the capabilities of this device as a non-perturbative technique to measure the temperature of the laser-produced plasma after the laser interaction. Mass spectra obtained from silver, aluminium, gold and silicon samples were used to identify and quantify the ion population created. Additionally, the ionization ratios were calculated and input in a coronal ionization equilibrium model to calculate the effective temperature of the plasma after the ablation process. Temperatures ranging 1.35 to 1.84 eV were measured for the different materials, with heavier elements having lower temperatures than the lighter ones.
A capillary laser with output in the extreme ultra-violet at wavelength 46.9 nm is used to ablate solid targets of parylene- N (CH), PMMA, aluminum and gold. We summarize results obtained using different focusing optics: a Fresnel zone plate, an off-axis spherical multi-layer mirror and on-axis multi-layer and gold mirrors. The Fresnel zone plate has a small aperture and focuses a small fraction of the laser energy to a small diameter (< 1 μm) with peak intensities 6 x 109Wcm-2. The off-axis spherical multi-layer mirror allows for a measurement of the transmission of the laser through thin targets, but the off-axis geometry produced an aberrated focus. The on-axis multi-layer mirror allows focusing to intensities of approximately 5 x 1010 Wcm-2 with a cylindrically symmetric focus.
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