Eugene Miloslavsky
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 6 December 2004 Paper
Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.568420
KEYWORDS: Optical proximity correction, Feedback loops, Multilayers, Tolerancing, SRAF, Computer simulations, Visualization, Overlay metrology, Manufacturing, Resolution enhancement technologies

Proceedings Article | 28 August 2003 Paper
Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504274
KEYWORDS: Photomasks, Manufacturing, Resolution enhancement technologies, Optical proximity correction, Beam shaping, Vestigial sideband modulation, Data conversion, Optics manufacturing, Detection and tracking algorithms, Lithography

Proceedings Article | 7 June 1996 Paper
Proceedings Volume 2726, (1996) https://doi.org/10.1117/12.240907
KEYWORDS: Optical proximity correction, Photomasks, Systems modeling, Data modeling, Convolution, System on a chip, Sodium, Lithography, Photoresist processing, Process modeling

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