Mr. Fu-Min Wang Profile

Fu-Min Wang

at National Taiwan Univ

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 5 April 2012 Paper

Electron-beam proximity effect model calibration for fabricating scatterometry calibration samples

Yu-Tian Shen, Chun-Hung Liu, Chih-Yu Chen, Hoi-Tou Ng, Kuen-Yu Tsai, Fu-Ming Wang, Chieh-Hsiung Kuan, Yen-Min Lee, Hsin-Hung Cheng, Jia-Han Li, Alek Chen

Proceedings Volume 8324, 83242K (2012) https://doi.org/10.1117/12.918109

KEYWORDS: Calibration, Line edge roughness, Scatterometry, Point spread functions, Process modeling, Scanning electron microscopy, Metrology, Scattering, Semiconducting wafers, Cadmium

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SPIE Journal Paper | 1 April 2011

Errata: Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Kuen-Yu Tsai, Yen-Min Lee, Alek Chen, Philip Ng, Fu-Min Wang, Jia-Han Li

JM3, Vol. 10, Issue 02, 029801, (April 2011) https://doi.org/10.1117/12.10.1117/1.3576188

SPIE Journal Paper | 1 January 2011

Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects

Philip Ng, Kuen-Yu Tsai, Yen-Min Lee, Fu-Min Wang, Jia-Han Li, Alek Chen

JM3, Vol. 10, Issue 1, 013004, (January 2011) https://doi.org/10.1117/12.10.1117/1.3533222

KEYWORDS: Photomasks, Model-based design, 3D modeling, Extreme ultraviolet, Optical proximity correction, Process modeling, Computer simulations, Projection lithography, Scanners, Extreme ultraviolet lithography

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SPIE Journal Paper | 1 October 2010

Efficient scattering simulations for equivalent extreme ultraviolet mask multilayer structures by modified transmission line theory and finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Hang Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

JM3, Vol. 9, Issue 04, 043003, (October 2010) https://doi.org/10.1117/12.10.1117/1.3503532

KEYWORDS: Extreme ultraviolet, Finite-difference time-domain method, Reflectivity, Refractive index, Scattering, Computer simulations, Silicon, Photomasks, Molybdenum, Surface roughness

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Proceedings Article | 12 December 2009 Paper

Using transmission line theory to calculate equivalent refractive index of EUV mask multilayer structures for efficient scattering simulation by finite-difference time-domain method

Yen-Min Lee, Jia-Han Li, Philip Ng, Ting-Han Pei, Fu-Min Wang, Kuen-Yu Tsai, Alek Chen

Proceedings Volume 7520, 75200W (2009) https://doi.org/10.1117/12.837150

KEYWORDS: Finite-difference time-domain method, Extreme ultraviolet, Computer simulations, Reflectivity, Refractive index, Error analysis, Scattering, Molybdenum, Silicon, Surface roughness

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Proceedings Article | 11 December 2009 Paper

A fully model-based methodology for simultaneously correcting EUV mask shadowing and optical proximity effects with improved pattern transfer fidelity and process windows

Philip C. W. Ng, Kuen-Yu Tsai, Yen-Min Lee, Ting-Han Pei, Fu-Min Wang, Jia-Han Li, Alek Chen

Proceedings Volume 7520, 75200S (2009) https://doi.org/10.1117/12.837077

KEYWORDS: Photomasks, Model-based design, 3D modeling, Optical proximity correction, Semiconducting wafers, Computer simulations, Extreme ultraviolet, Process modeling, Extreme ultraviolet lithography, Image segmentation

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Showing 5 of 6 publications

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