Dr. Gen Tsutsui
at IBM Thomas J. Watson Research Ctr.
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12953, 1295305 (2024) https://doi.org/10.1117/12.3012023
KEYWORDS: Line width roughness, Light sources and illumination, Nanoimprint lithography, Optical lithography, Line edge roughness, Etching, Transistors, Extreme ultraviolet, Reactive ion etching, Extreme ultraviolet lithography

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