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George Petricich
at DNS Electronics LLC
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Publications (1)
Proceedings Article | 16 June 2003 Paper
Supercritical resist dry technique for electron-beam projection lithography (EPL)
George Petricich, Kohei Suzuki, Jun Munemasa, Tetsuya Yoshikawa, Nobuyuki Kawakami, Sumito Shimizu, Manabu Watanabe
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484990
KEYWORDS: Liquids, Etching, Single crystal X-ray diffraction, Photoresist processing, Plasma etching, Lithography, Capillaries, Carbon dioxide, Projection lithography, Semiconducting wafers
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