Unspecified Gideon Oyibo Profile

Gideon Oyibo

at IBM Thomas J Watson Research Ctr

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Publications (1)

Proceedings Article | 10 April 2024 Presentation

EUV double patterning solution for subtractive metal patterning at 18nm pitch

Christopher Penny, Koichi Motoyama, Hosadurga Shobha, Nabil Azad, Taesun Kim, Shravana Katakam, Johnsoo Kim, Joe Lee, Gideon Oyibo, Jaemyung Choi, Stuart Sieg, Tenko Yamashita, John Arnold, Kisik Choi

Proceedings Volume PC12958, (2024) https://doi.org/10.1117/12.3016092

KEYWORDS: Optical lithography, Extreme ultraviolet, Double patterning technology, Metals, Design and modelling, Ruthenium, Extreme ultraviolet lithography, Copper, Resistors, Resistance

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