Dr. Hans-Jürgen Rostalski Profile

Dr. Hans-Jürgen Rostalski

at Carl Zeiss SMT AG

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 19 July 2006 Paper

Use of diffractive lenses in lithographic projection lenses

H.-J. Rostalski, A. Epple, H. Feldmann

Proceedings Volume 6342, 63421S (2006) https://doi.org/10.1117/12.692314

KEYWORDS: Lenses, Lithography, Diffractive optical elements, Lens design, Colorimetry, Combined lens-mirror systems, Chromatic aberrations, Calcium, Mirrors, Optical design

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Proceedings Article | 15 October 2005 Paper

Use of diffractive optical elements in lithographic projection lenses

H.-J. Rostalski, A. Epple, H. Feldmann

Proceedings Volume 5962, 59621A (2005) https://doi.org/10.1117/12.625192

KEYWORDS: Lenses, Diffractive optical elements, Lithography, Lens design, Colorimetry, Combined lens-mirror systems, Chromatic aberrations, Calcium, Mirrors, Glasses

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Proceedings Article | 15 October 2005 Paper

Catadioptric projection lenses for immersion lithography

Heiko Feldmann, Aurelian Dodoc, Alexander Epple, Hans-Jürgen Rostalski, David Shafer, Wilhelm Ulrich

Proceedings Volume 5962, 59620Y (2005) https://doi.org/10.1117/12.625199

KEYWORDS: Mirrors, Combined lens-mirror systems, Lenses, Lithography, Refractor telescopes, Immersion lithography, Optical design, Monochromatic aberrations, Beam splitters, Relays

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SPIE Journal Paper | 1 January 2004

Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss

Wilhelm Ulrich, Hans Rostalski, Russell Hudyma

JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637592

KEYWORDS: Lenses, Refractor telescopes, Lithography, Deep ultraviolet, Objectives, Lens design, Ultraviolet radiation, Microscopes, Semiconducting wafers, Wavefronts

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Proceedings Article | 23 December 2002 Paper

Development of dioptric projection lenses for DUV lithography

Wilhelm Ulrich, Hans-Juergen Rostalski, Russell Hudyma

Proceedings Volume 4832, (2002) https://doi.org/10.1117/12.486477

KEYWORDS: Lenses, Refractor telescopes, Lithography, Deep ultraviolet, Objectives, Projection lithography, Optical lithography, Logic, Application specific integrated circuits, Ultraviolet lenses

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Proceedings Article | 15 April 1993 Paper

Design of an aberration-corrected holographic grating with high spectral and spatial resolution

H. Kohn, H.-J. Rostalski, Ch. Budzinski, A. Mitreiter

Proceedings Volume 1780, 178010 (1993) https://doi.org/10.1117/12.142830

KEYWORDS: Spatial resolution, Holography, Optical design, Diffraction gratings, CCD cameras

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Proceedings Article | 2 March 1993 Paper

Aberration-corrected holographic concave diffraction grating with high spectral resolution

Christel Budziuski, Heinz Kohn, Hans Rostalski, Guenther Fenske, Andreas Mitreiter

Proceedings Volume 1732, (1993) https://doi.org/10.1117/12.140410

KEYWORDS: Diffraction gratings, Holography, Spectral resolution, Diffraction, Optical design, Photoresist materials, Photoresist developing, Environmental monitoring, Spherical lenses, Spectroscopy

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Showing 5 of 7 publications

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