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Hisashi Nakagawa
at Nihon Pall Ltd
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Author
Publications (1)
Proceedings Article | 27 March 2019 Presentation + Paper
Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise
Toru Umeda, Eric Shiu, Takehito Mizuno, Hisashi Nakagawa, Tetsuya Murakami, Shuichi Tsuzuki
Proceedings Volume 10960, 1096018 (2019) https://doi.org/10.1117/12.2515163
KEYWORDS: Coating, Metals, Bridges, Inspection, Semiconducting wafers, Particles, Silicon, Photoresist materials, Lithography, Adsorption
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