Jie Wang
at Semiconductor Manufacturing International Corp.
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 September 2019 Paper
Dejian Li, Fen Xue, Cong Lu, Wenjun Ling, Xuefei Qin, Jie Wang
Proceedings Volume 11148, 1114816 (2019) https://doi.org/10.1117/12.2536622
KEYWORDS: Photomasks, Ions, Air contamination, Distortion, Mask making, Semiconducting wafers, Image registration, Mask cleaning, Scanning electron microscopy, Image processing

Proceedings Article | 26 September 2019 Paper
Proceedings Volume 11148, 1114812 (2019) https://doi.org/10.1117/12.2536494
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Lithography, Mask making, Optical proximity correction, Manufacturing, Defect inspection, Scanners, Computer simulations

Proceedings Article | 3 October 2018 Paper
Proceedings Volume 10810, 108100Z (2018) https://doi.org/10.1117/12.2501753
KEYWORDS: Plasma, Etching, Edge roughness, Oxides, Photomasks, Oxygen, Distortion, Plasma etching

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