Dr. Jong-Ahn Kim Profile

Dr. Jong-Ahn Kim

at Korea Research Institute of Standards and Science

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Author

Publications (16)

SPIE Journal Paper | 27 May 2022 Open Access

Time-of-flight measurement-based three-dimensional profiler system employing a lightweight Fresnel-type Risley prism scanner

Jae Heun Woo, Chu-Shik Kang, Jong-Ahn Kim, Jae Wan Kim, Sunghoon Eom, Jae Yong Lee

OE, Vol. 61, Issue 05, 054104, (May 2022) https://doi.org/10.1117/12.10.1117/1.OE.61.5.054104

KEYWORDS: 3D metrology, Prisms, 3D scanning, 3D acquisition, Laser scanners, Clouds, Scanners, Distortion, Optical engineering, 3D-TOF imaging

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Proceedings Article | 5 June 2013 Paper

Uncertainty evaluation of the geometrical thickness and refractive index of silicon wafers

Jonghan Jin, Jungjae Park, Jae Wan Kim, Jong-Ahn Kim, Chu-Shik Kang

Proceedings Volume 8706, 87060W (2013) https://doi.org/10.1117/12.2014800

KEYWORDS: Semiconducting wafers, Silicon, Refractive index, Wafer-level optics, Geometrical optics, Fourier transforms, Light sources, Pulsed laser operation, Spectroscopy, Femtosecond phenomena

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Proceedings Article | 5 June 2013 Paper

Simultaneous measurement of the thickness profile and refractive index distribution of silicon wafers

Jungjae Park, Jonghan Jin, Jae Wan Kim, Chu-Shik Kang, Jong-Ahn Kim

Proceedings Volume 8706, 87060V (2013) https://doi.org/10.1117/12.2014799

KEYWORDS: Refractive index, Semiconducting wafers, Silicon, Pulsed laser operation, Femtosecond phenomena, Wafer-level optics, Phase measurement, Reliability, Semiconductor lasers, Light sources

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Proceedings Article | 13 May 2013 Paper

Tape measuring system using linear encoder and digital camera

Tae Bong Eom, Don Young Jeong, Myung Soon Kim, Jae Wan Kim, Jong Ahn Kim

Proceedings Volume 8788, 87883P (2013) https://doi.org/10.1117/12.2020470

KEYWORDS: Computer programming, Calibration, Imaging systems, Optical microscopes, Digital cameras, CCD cameras, Tablets, Interferometers, Aluminum, Distance measurement

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We have designed and constructed the calibration system of line standards such as tape and rule for the secondary calibration laboratories. The system consists of the main body with linear stage and linear encoder, the optical microscope with digital camera, and the computer. The base of the system is a aluminum profile with 2.9 m length, 0.09 m height and 0.18 m width. The linear stage and the linear encoder are fixed on the aluminum profile. The micro-stage driven by micrometer is fixed on the carriage of the long linear stage, and the optical microscope with digital camera and the tablet PC are on the this stage. The linear encoder counts the moving distance of the linear stage with resolution of 1 μm and its counting value is transferred to the tablet PC. The image of the scale mark of the tape is captured by the CCD camera of optical microscope and transferred to the PC through USB interface. The computer automatically determines the center of the scale mark by image processing technique and at the same time reads the moving distance of the linear stage. As a result, the computer can calculate the interval between the scale marks of the tape. In order to achieve the high accuracy, the linear encoder should be calibrated using the laser interferometer or the rigid steel rule. This calibration data of the linear encoder is stored at the computer and the computer corrects the reading value of the linear encoder. In order to determine the center of the scale mark, we use three different algorithms. First, the image profile over specified threshold level is fitted in even order polynomial and the axis of the polynomial is used as the center of the line. Second, the left side and right side areas at the center of the image profile are calculated so that two areas are same. Third, the left and right edges of the image profile are determined at every intensity level of the image and the center of the graduation is calculated as an average of the centers of the left and right edges at all intensity levels. The system can measure the line standards up to 2.5 m. The expanded uncertainty for the tape calibration is U = [(0.04)²+ (0.015•L)²]^1/2 mm, where L is measured length of the tape or rule in meters. At this system, the long distance measuring instruments such as ultrasonic distance meter or laser displacement sensor can be also calibrated.

Proceedings Article | 14 May 2012 Paper

A modified ladar system with a Geiger mode APD to remove a dead time problem

Sung Eun Jo, Hong Jin Kong, Tae Hoon Kim, Jonghan Jin, Jae Wan Kim, Jong-Ahn Kim

Proceedings Volume 8379, 83791A (2012) https://doi.org/10.1117/12.920522

KEYWORDS: LIDAR, Signal detection, Avalanche photodetectors, Avalanche photodiodes, Sensors, Distance measurement, Light sources, Photodiodes, Time metrology, Standards development

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Proceedings Article | 14 May 2010 Paper

One-shot measurement of surface profile using an astigmatic microscope system

C.-S. Kang, J.-U. Lee, J. W. Kim, J.-A. Kim, J. Jin, T. B. Eom

Proceedings Volume 7718, 77180X (2010) https://doi.org/10.1117/12.854124

KEYWORDS: Point spread functions, 3D metrology, Cylindrical lenses, Optical components, Sensors, Cerium, Microscopes, Computer simulations, Monochromatic aberrations, Calibration

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Proceedings Article | 17 June 2009 Paper

Gauge block calibration by using a high speed phase shifting interferometer comprising two frequency scanning diode lasers

Jae Wan Kim, Jong-Ahn Kim, Roma Jang, Chu-Shik Kang

Proceedings Volume 7389, 73890U (2009) https://doi.org/10.1117/12.827455

KEYWORDS: Interferometers, Semiconductor lasers, Phase shifting, Calibration, Phase shifts, Laser stabilization, Light sources, Phase interferometry, Interferometry, Confocal microscopy

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Proceedings Article | 10 September 2007 Paper

Calibration of integrating sphere system designed for roughness correction in optical calibration of gauge blocks

Chu-Shik Kang, Jae Wan Kim, Jong-Ahn Kim, Tae Bong Eom

Proceedings Volume 6672, 66720O (2007) https://doi.org/10.1117/12.733712

KEYWORDS: Calibration, Integrating spheres, Phase shifts, Surface roughness, Light scattering, Optical calibration, Reflection, System integration, Scattering, Optical interferometry

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Proceedings Article | 10 September 2007 Paper

Development of a precision dual level stage system for the dimensional metrology of large range surface topography

Jong-Ahn Kim, Jae Wan Kim, Tae Bong Eom, Chu-Shik Kang

Proceedings Volume 6672, 66720T (2007) https://doi.org/10.1117/12.732617

KEYWORDS: Interferometers, Mirrors, Metrology, Field programmable gate arrays, Dimensional metrology, Ferroelectric materials, Motion measurement, Control systems, Amplifiers, Scanning probe microscopy

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Proceedings Article | 18 August 2005 Paper

Calibration of two-dimensional nanometer gratings using optical diffractometer and metrological atomic force microscope

Jong-Ahn Kim, Jae Wan Kim, Byong Chon Park, Tae Bong Eom, Chu-Shik Kang

Proceedings Volume 5879, 58790Z (2005) https://doi.org/10.1117/12.614786

KEYWORDS: Calibration, Metrology, Diffraction, Interferometers, Atomic force microscope, Beam splitters, Scanning electron microscopy, Sensors, Temperature metrology, Diffraction gratings

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Proceedings Article | 18 August 2005 Paper

A novel Michelson interferometer combined with an autocollimator for the simultaneous measurement of linear and angular displacement

Jae Wan Kim, Jong-Ahn Kim, Chu-Shik Kang, Tae Bong Eom

Proceedings Volume 5879, 587911 (2005) https://doi.org/10.1117/12.616497

KEYWORDS: Autocollimators, Mirrors, Interferometers, Motion measurement, Mica, Michelson interferometers, Wave plates, Beam splitters, Polarization, Prototyping

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Proceedings Article | 10 May 2005 Paper

Precision carbon nanotube tip for critical dimension measurement with atomic force microscope

B. Park, K. Jung, J. Hong, W. Song, B.-h. O, J. Kim

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599245

KEYWORDS: Atomic force microscopy, Carbon nanotubes, Scanning electron microscopy, Ion beams, Atomic force microscope, Ions, Silicon, Critical dimension metrology, Metrology, Image processing

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SPIE Journal Paper | 1 December 2001

Application of sensitivity analysis for the design of six-degree-of-freedom measurement system

Jong-Ahn Kim, Eui Bae, Soo Hyun Kim, Yoon Keun Kwak

OE, Vol. 40, Issue 12, (December 2001) https://doi.org/10.1117/12.10.1117/1.1418714

KEYWORDS: Sensors, Diffraction gratings, Diffraction, Error analysis, Seaborgium, Optical engineering, Motion measurement, Beam propagation method, Electric field sensors, CCD cameras

Proceedings Article | 12 February 2001 Paper

Micromotion measurement system for millistructure using diffraction grating

Eui Bae, Jong-Ahn Kim, Soo Hyun Kim, Yoon Keun Kwak

Proceedings Volume 4190, (2001) https://doi.org/10.1117/12.417235

KEYWORDS: Diffraction gratings, Sensors, Motion measurement, Kinematics, Diffraction, Signal detection, Photodiodes, Interferometers, Laser sources, Head

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Proceedings Article | 29 March 2000 Paper

Accuracy enhancement of point triangulation probes for linear displacement measurement

Kyung-Chan Kim, Jong-Ahn Kim, SeBaek Oh, Soo Hyun Kim, Yoon Keun Kwak

Proceedings Volume 3945, (2000) https://doi.org/10.1117/12.380524

KEYWORDS: Laser induced damage, Sensors, Signal processing, Light sources, Detection and tracking algorithms, Detector arrays, Light, Speckle, Interference (communication), Light emitting diodes

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Proceedings Article | 29 March 2000 Paper

Multi-degree-of-freedom displacement measurement system using a diffraction grating

Jong-Ahn Kim, Kyung-Chan Kim, Eui Bae, Soo Hyun Kim, Yoon Keun Kwak

Proceedings Volume 3945, (2000) https://doi.org/10.1117/12.380531

KEYWORDS: Diffraction gratings, Sensors, Sensing systems, Semiconductor lasers, Kinematics, Control systems, Diffraction, Magnesium, Vibrometry, Actuators

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Showing 5 of 16 publications

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