CONFERENCE PROCEEDINGS
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Jong Hwa Lee
Director at S&S TECH
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Publications (3)
Proceedings Article | 21 November 2023 Poster + Paper
A study on the imaging characteristics of phase shift mask for EUV technology with novel material
Minkyu P., Mikyung W., Gyeongwon S., Yongdae K., Chulkyu Y., Jonghwa L., Cheol S.
Proceedings Volume 12751, 127511B (2023) https://doi.org/10.1117/12.2687346
KEYWORDS: Extreme ultraviolet, Phase shifts, Resolution enhancement technologies, Optical properties, Optical lithography, Materials properties, Manufacturing, Lithography, Extreme ultraviolet lithography, Etching
Proceedings Article | 26 September 2016 Paper
Development of advanced multi-tone mask by using two different transmittance modulation materials
Sei-Min Kim, Min-Ki Choi, Seong-Min Seo, Jong-Hwa Lee, Cheol Shin, Woo-Gun Jeong, Sung-Mo Jung, Kee-Soo Nam
Proceedings Volume 9985, 99850D (2016) https://doi.org/10.1117/12.2241336
KEYWORDS: Transmittance, Modulation, Photomasks, Manufacturing, Thin films, Etching, Reflectivity, Chromium, Lithography, Optical lithography
Proceedings Article | 8 October 2014 Paper
Development and characterization of advanced phase-shift mask blanks for 14nm node and beyond
Chang-Jun Kim, Kyu-Jin Jang, Min-Ki Choi, Chul-Kyu Yang, Jae-Chul Lee, Jong-Keun Lee, Byung-Sun Kang, Jong-Hwa Lee, Cheol Shin, Kee-Soo Nam
Proceedings Volume 9235, 92351L (2014) https://doi.org/10.1117/12.2066112
KEYWORDS: Photomasks, Etching, Phase shifts, Chromium, Semiconducting wafers, Molybdenum, Transmittance, Manufacturing, Sputter deposition, Scanning probe microscopy
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