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Chang Jun Kim
at S&S TECH
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Publications (1)
Proceedings Article | 8 October 2014 Paper
Development and characterization of advanced phase-shift mask blanks for 14nm node and beyond
Chang-Jun Kim, Kyu-Jin Jang, Min-Ki Choi, Chul-Kyu Yang, Jae-Chul Lee, Jong-Keun Lee, Byung-Sun Kang, Jong-Hwa Lee, Cheol Shin, Kee-Soo Nam
Proceedings Volume 9235, 92351L (2014) https://doi.org/10.1117/12.2066112
KEYWORDS: Photomasks, Etching, Phase shifts, Chromium, Semiconducting wafers, Molybdenum, Transmittance, Manufacturing, Sputter deposition, Scanning probe microscopy
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