Dr. Kazunori Sakai Profile

Dr. Kazunori Sakai

at JSR Corp

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Author

Publications (9)

Proceedings Article | 1 May 2023 Poster + Paper

Thin underlayer materials for metal oxide resist patterning

Satoshi Dei, Yuya Hayashi, Shumpei Akita, Shuhei Yamada, Kazunori Sakai, Tatsuya Kasai, Akitaka Nii, Ayaka Furusawa, Kazuya Takada, Tetsuro Kaneko, Tomoaki Seko, Eiji Yoneda, Tatsuya Sakai

Proceedings Volume 12498, 124981M (2023) https://doi.org/10.1117/12.2657918

KEYWORDS: Optical lithography, Silicon carbide, Extreme ultraviolet, Absorption, Silicon, Surface properties, Lithography, Extreme ultraviolet lithography, Etching, Semiconducting wafers

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Proceedings Article | 25 March 2019 Paper

Development of metal organic cluster EUV photoresists

Kazunori Sakai, Seok Heon Jung, Wenyang Pan, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10960, 1096015 (2019) https://doi.org/10.1117/12.2516133

KEYWORDS: Metals, Extreme ultraviolet lithography, Photoresist materials, Deep ultraviolet, Extreme ultraviolet, Lithography, Nanoparticles, Oxides

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Proceedings Article | 25 March 2019 Paper

Radical sensitive zinc-based nanoparticle EUV photoresists

Kou Yang, Hong Xu, Kazunori Sakai, Vasiliki Kosma, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10960, 109601R (2019) https://doi.org/10.1117/12.2514982

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Deep ultraviolet, Lithography, Zinc, Optical lithography, Metals, Polymers

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Proceedings Article | 20 March 2019 Presentation + Paper

Metal organic cluster photoresists: new metal oxide systems

Kazunori Sakai, Seok-Heon Jung, Wenyang Pan, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10963, 1096306 (2019) https://doi.org/10.1117/12.2515148

KEYWORDS: Metals, Zirconium, Nanoparticles, Oxides, Extreme ultraviolet lithography, Zinc, Photoresist materials, Etching, Extreme ultraviolet, Lithography

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SPIE Journal Paper | 8 December 2018

EUV photolithography: resist progress in metal–organic complex photoresists

Hong Xu, Vasiliki Kosma, Kazunori Sakai, Emmanuel P. Giannelis, Christopher K. Ober

JM3, Vol. 18, Issue 01, 011007, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.18.1.011007

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet lithography, Oxides, Optical lithography, Lithography, Hafnium, Etching, Metals, Zirconium

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Proceedings Article | 19 March 2018 Open Access

EUV photolithography: resist progress and challenges

Christopher Ober, Hong Xu, Vasiliki Kosma, Kazunori Sakai, Emmanuel Giannelis

Proceedings Volume 10583, 1058306 (2018) https://doi.org/10.1117/12.2302759

KEYWORDS: Nanoparticles, Photoresist materials, Oxides, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography, Etching, Metals, Hafnium, Zirconium

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Proceedings Article | 19 March 2018 Paper

Patterning mechanism of metal based hybrid EUV resists

Vasiliki Kosma, Kazuki Kasahara, Hong Xu, Kazunori Sakai, Christopher Ober, Emmanuel Giannelis

Proceedings Volume 10583, 105831U (2018) https://doi.org/10.1117/12.2297383

KEYWORDS: Extreme ultraviolet lithography, Metals, Zirconium, Photoresist materials, Extreme ultraviolet, Photoresist developing, FT-IR spectroscopy, Optical lithography, Chemical species, Hafnium

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Proceedings Article | 19 March 2018 Paper

EUV metal oxide hybrid photoresists: ultra-small structures for high-resolution patterning

Hong Xu, Kou Yang, Kazunori Sakai, Vasiliki Kosma, Kazuki Kasahara, Emmanuel Giannelis, Christopher Ober

Proceedings Volume 10583, 105831P (2018) https://doi.org/10.1117/12.2297266

KEYWORDS: Nanoparticles, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Optical lithography, Lithography, Metals, Oxides, Zirconium

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Proceedings Article | 20 March 2015 Paper

Novel thin film analysis to investigate actual film formation

Kazunori Sakai, Kenji Mochida, Shinichi Nakamura, Tooru Kimura, Kazuhiro Yoshikawa, Naoki Man, Hirofumi Seiki, Masaaki Takeda

Proceedings Volume 9425, 942522 (2015) https://doi.org/10.1117/12.2085717

KEYWORDS: Oxygen, Fluorine, Etching, Process control, Distortion, Photoresist materials, Hydrogen, Thin films, Carbon, Profiling

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Showing 5 of 9 publications

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