Dr. Kazutoshi Takenoshita Profile

Dr. Kazutoshi Takenoshita

Research Scientist at Univ of Central Florida

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Author

Publications (14)

Proceedings Article | 22 March 2007 Paper

High repetition rate LPP source facility for EUVL

T. Schmid, S. George, J. Cunado, S. Teerawattanasook, R. Bernath, C. Brown, K. Takenoshita, C.-S. Koay, M. Richardson

Proceedings Volume 6517, 65173I (2007) https://doi.org/10.1117/12.713457

KEYWORDS: Extreme ultraviolet, Plasma, Mirrors, Calibration, Reflectivity, Extreme ultraviolet lithography, EUV optics, Metrology, Tin, Diagnostics

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Proceedings Article | 21 March 2007 Paper

Characterization of the tin-doped droplet laser plasma EUVL sources for HVM

Kazutoshi Takenoshita, Simi George, Tobias Schmid, Chiew-Seng Koay, Jose Cunado, Robert Bernath, Christopher Brown, Moza Al-Rabban, William Silfvast, Martin Richardson

Proceedings Volume 6517, 65173O (2007) https://doi.org/10.1117/12.713461

KEYWORDS: Extreme ultraviolet, Plasma, Ions, Mirrors, Tin, Extreme ultraviolet lithography, Diagnostics, Reflectivity, Pulsed laser operation, Gas lasers

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Proceedings Article | 15 March 2007 Paper

Tin inventory for HVM EUVL sources

Martin Richardson, Kazutoshi Takenoshita, Tobias Schmid

Proceedings Volume 6517, 65170S (2007) https://doi.org/10.1117/12.713463

KEYWORDS: Tin, Plasma, Extreme ultraviolet, Electrodes, Distributed interactive simulations, Resolution enhancement technologies, Extreme ultraviolet lithography, Plasma generation, Semiconducting wafers, Solids

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Proceedings Article | 24 March 2006 Paper

EUV generation from lithium laser plasma for lithography

Simi George, William Silfvast, Kazutoshi Takenoshita, Robert Bernath, Chiew-Seng Koay, Greg Shimkaveg, Martin Richardson, Moza Al-Rabban, Howard Scott

Proceedings Volume 6151, 615143 (2006) https://doi.org/10.1117/12.660584

KEYWORDS: Lithium, Plasma, Tin, Extreme ultraviolet, Lithography, Solids, Ions, Sensors, EUV optics, Light sources

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Proceedings Article | 6 May 2005 Paper

High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL

Chiew-Seng Koay, Simi George, Kazutoshi Takenoshita, Robert Bernath, Etsuo Fujiwara, Martin Richardson, Vivek Bakshi

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596753

KEYWORDS: Tin, Plasma, Extreme ultraviolet, Pulsed laser operation, Calibration, Extreme ultraviolet lithography, Ions, Laser energy, Spectroscopy, Xenon

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Proceedings Article | 6 May 2005 Paper

EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas

Simi George, Chiew-Seng Koay, Kazutoshi Takenoshita, Robert Bernath, Moza Al-Rabban, Christian Keyser, Vivek Bakshi, Howard Scott, Martin Richardson

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596781

KEYWORDS: Tin, Plasma, Extreme ultraviolet, Spectroscopy, Ions, Spectrometers, Solids, Pulsed laser operation, Extreme ultraviolet lithography, Lithium

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Proceedings Article | 6 May 2005 Paper

Debris characterization and mitigation from microscopic laser-plasma tin-doped droplet EUV sources

Kazutoshi Takenoshita, Chiew-Seng Koay, Somsak Teerawattansook, Martin Richardson, Vivek Bakshi

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.596764

KEYWORDS: Ions, Plasma, Tin, Mirrors, Atmospheric particles, Particles, Spectroscopy, Extreme ultraviolet, Reflectivity, Plasma generation

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Proceedings Article | 17 March 2005 Paper

Diagnostics for laser plasma EUV sources

Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, C. Keyser, Robert Bernath, Simi George, Somsak Teerawattanasook

Proceedings Volume 5580, (2005) https://doi.org/10.1117/12.597349

KEYWORDS: Plasma, Extreme ultraviolet, Mirrors, Crystals, Diagnostics, Extreme ultraviolet lithography, Imaging systems, Imaging spectroscopy, Sensors, Zirconium

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Proceedings Article | 20 May 2004 Paper

Debris studies for the tin-based droplet laser-plasma EUV source

Kazutoshi Takenoshita, Chiew-seng Koay, Somsak Teerawattanasook, Martin Richardson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.541533

KEYWORDS: Ions, Tin, Mirrors, Plasma, Extreme ultraviolet, Spectroscopy, Particles, Oxygen, Electrons, Signal detection

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Proceedings Article | 20 May 2004 Paper

Laser plasma EUVL sources: progress and challenges

Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, C. Keyser, S. George, Somsak Teerawattansook, Moza Al-Rabban, H. Scott

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.541586

KEYWORDS: Plasma, Tin, Ions, Mirrors, Xenon, Extreme ultraviolet lithography, Atmospheric particles, Extreme ultraviolet, Spectrometers, Oxygen

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Proceedings Article | 20 May 2004 Paper

Spectroscopic studies of the Sn-based droplet laser plasma EUV source

Chiew-Seng Koay, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza Al-Rabban, Martin Richardson

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.541575

KEYWORDS: Plasma, Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Spectroscopy, Optical simulations, Xenon, Ions, Laser development

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Proceedings Article | 7 January 2004 Paper

High-efficiency tin-based EUV sources

Martin Richardson, Chiew-Seng Koay, Christian Keyser, Kazutoshi Takenoshita, Etsuo Fujiwara, Moza Al-Rabban

Proceedings Volume 5196, (2004) https://doi.org/10.1117/12.514083

KEYWORDS: Plasma, Extreme ultraviolet, Ions, Mirrors, Tin, Xenon, Pulsed laser operation, Sensors, Spectroscopy, Reflectivity

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Proceedings Article | 16 June 2003 Paper

High-conversion-efficiency tin material laser-plasma source for EUVL

Chiew-Seng Koay, Christian Keyser, K. Takenoshita, Etsuo Fujiwara, Moza Al-Rabban, Martin Richardson, I. C. Edmond Turcu, Harry Rieger, A. Stone, James Morris

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504572

KEYWORDS: Plasma, Tin, Extreme ultraviolet, Extreme ultraviolet lithography, Pulsed laser operation, Mirrors, Sensors, Laser development, Reflectivity, Optical filters

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Proceedings Article | 16 June 2003 Paper

Repeller field debris mitigation approach for EUV sources

K. Takenoshita, Chiew-Seng Koay, Martin Richardson, I. C. Edmond Turcu

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.504570

KEYWORDS: Ions, Plasma, Tin, Mirrors, Scanning electron microscopy, Glasses, Extreme ultraviolet, Atomic force microscopy, Spectroscopy, Electrodes

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Showing 5 of 14 publications

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