Mr. Kei Sakai Profile

Kei Sakai

at Hitachi High-Tech Corp

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 30 March 2020 Presentation + Paper

High-accuracy, high-speed, and smart metrology in the EUV era

Zhigang Wang, Kei Sakai, Yasushi Ebizuka, Masumi Shirai, Makoto Suzuki

Proceedings Volume 11325, 113251Q (2020) https://doi.org/10.1117/12.2551868

KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Artificial intelligence, Image processing, Semiconducting wafers, Stochastic processes, Critical dimension metrology, Error analysis, Inspection

Read Abstract +

Proceedings Article | 26 September 2019 Paper

Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement (Poster presentation)

Hiroshi Fukuda, Yoshinori Momonoi, Kei Sakai

Proceedings Volume 11147, 111471A (2019) https://doi.org/10.1117/12.2535664

KEYWORDS: Stochastic processes, Extreme ultraviolet lithography, Critical dimension metrology, Inspection, Optical inspection, Chemical reactions, Monte Carlo methods, Photomasks, Semiconducting wafers, Ranging

Read Abstract +

SPIE Journal Paper | 3 May 2019 Open Access

Estimating extremely low probability of stochastic defect in extreme ultraviolet lithography from critical dimension distribution measurement

Hiroshi Fukuda, Yoshinori Momonoi, Kei Sakai

JM3, Vol. 18, Issue 02, 024002, (May 2019) https://doi.org/10.1117/12.10.1117/1.JMM.18.2.024002

KEYWORDS: Stochastic processes, Inspection, Cadmium, Extreme ultraviolet lithography, Semiconducting wafers, Extreme ultraviolet, Statistical analysis, Critical dimension metrology, Integrated circuits, Defect inspection

Read Abstract +

DOWNLOAD PAPER

SPIE Journal Paper | 23 July 2018

Measurement of pattern roughness and local size variation using CD-SEM

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

JM3, Vol. 17, Issue 04, 041004, (July 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.041004

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Detection and tracking algorithms, Critical dimension metrology, Image filtering, Stochastic processes, Metrology, Reliability

Read Abstract +

Proceedings Article | 13 March 2018 Paper

Measurement of pattern roughness and local size variation using CD-SEM: current status

Hiroshi Fukuda, Takahiro Kawasaki, Hiroki Kawada, Kei Sakai, Takashi Kato, Satoru Yamaguchi, Masami Ikota, Yoshinori Momonoi

Proceedings Volume 10585, 105850H (2018) https://doi.org/10.1117/12.2299633

KEYWORDS: Line edge roughness, Scanning electron microscopy, Edge detection, Signal to noise ratio, Critical dimension metrology, Detection and tracking algorithms, Metrology, Reliability, Process control, Image filtering

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Line edge roughness measurement technique for fingerprint pattern in block copolymer thin film

Miki Isawa, Kei Sakai, Paulina Rincon Delgadillo, Roel Gronheid, Hiroshi Yoshida

Proceedings Volume 8681, 868114 (2013) https://doi.org/10.1117/12.2010915

KEYWORDS: Line edge roughness, Picosecond phenomena, Line width roughness, Polymethylmethacrylate, Edge roughness, Optical lithography, Thin films, Materials processing, Scanning electron microscopy, Directed self assembly

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years