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Lisa Lemberg
at Heidelberg Instruments Mikrotechnik GmbH
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Publications (1)
Proceedings Article | 17 June 2024 Presentation + Paper
Advances in modeling and optimization for two-photon lithography
Valeriia Sedova, Florie Ogor, Joёl Rovera, Odysseas Tsilipakos, Lisa Lemberg, Kevin Heggarty, Andreas Erdmann
Proceedings Volume 13023, 1302309 (2024) https://doi.org/10.1117/12.3017407
KEYWORDS: Voxels, Polymerization, Data modeling, Fabrication, Diffusion, Two photon polymerization, Modeling, Lithography, Photoresist materials, 3D modeling
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