Mr. Makoto Nakamura Profile

Makoto Nakamura

Applications Engineer at ASML

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Publications (2)

Proceedings Article | 20 October 2006 Paper

Application of Dosemapper for 65-nm gate CD control: strategies and results

Nazneen Jeewakhan, Nader Shamma, Sang-Jun Choi, Roque Alvarez, D. Son, Makoto Nakamura, Vinny Pici, Jim Schreiber, Wei-shun Tzeng, Sean Ang, Daniel Park

Proceedings Volume 6349, 63490G (2006) https://doi.org/10.1117/12.692938

KEYWORDS: Etching, Critical dimension metrology, Semiconducting wafers, Charge-coupled devices, Lithography, Tolerancing, Reticles, Manufacturing, Neodymium, Photomasks

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Proceedings Article | 22 January 2001 Paper

High-optical-density photomasks for large exposure applications

Dan Schurz, Warren Flack, Makoto Nakamura

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410770

KEYWORDS: Reticles, Photoresist materials, Semiconducting wafers, Chromium, Photomasks, Absorption, Scanning electron microscopy, Ultraviolet radiation, Spectrophotometry, Absorbance

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