Dr. Matthew D. Coventry Profile

Dr. Matthew D. Coventry

at Starfire Industries LLC

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Author

Publications (2)

Proceedings Article | 21 March 2007 Paper

Experimental results for an addressable xenon microdischarge EUV-source array for HVM lithography

Brian Jurczyk, Robert Stubbers, Darren Alman, Josh Rovey, Matthew Coventry

Proceedings Volume 6517, 65173G (2007) https://doi.org/10.1117/12.712321

KEYWORDS: Extreme ultraviolet, Plasma, Xenon, Mirrors, Light, Electrodes, Photodiodes, Lithography, Optical components, Reticles

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Proceedings Article | 6 May 2005 Paper

Characterization of collector optic material samples before and after exposure in LPP and DPP EUV sources

Huatan Qiu, Darren Alman, Keith Thompson, Matthew Coventry, Joshua Spencer, Matthew Hendricks, Erik Antonsen, Brian Jurczyk, David Ruzic, Tim Spila, Ginger Edwards, Stefan Wurm, Obert Wood, Robert Bristol

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600093

KEYWORDS: Molybdenum, Silicon, Ruthenium, Gold, Ions, Xenon, Palladium, Extreme ultraviolet lithography, Atomic force microscopy, Crystals

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The University of Illinois at Urbana-Champaign (UIUC) and several national laboratories are collaborating on an SEMATECH effort to characterize xenon plasma exposure effects on EUV condenser optics. A series of mirror samples provided by SEMATECH were exposed for 10M shots in an Xtreme Technologies XTS 13-35 commercial EUV discharge plasma source at UIUC and 5M at the high-power TRW laser plasma source at Sandia National Laboratories. Results for both pre and post-exposure material characterization are presented, for samples exposed in both facilities. Surface analysis performed by the Center for Microanalysis of Materials at UIUC investigates mirror degradation mechanisms by measuring changes in surface roughness, texture, and grain sizes as well as analysis of implantation of energetic Xe ions, Xe diffusion, and mixing of multilayers. Materials characterization on samples removed after varying exposure times in the XTS source, together with in-situ EUV reflectivity measurements, identify the onset of different degradation mechanisms within each sample over 1M-100M shots. Results for DPP-exposed samples for 10 million shots in our XCEED (Xtreme Commercial EUV Exposure Device) experiment showed, in general, that samples were eroded and the surfaces were roughened with little change to the texture. AFM results showed an increase in roughness by a factor of 2-5 times, with two exceptions. This was confirmed by x-ray reflectivity (XRR) data, which showed similar roughening characteristics and also confirmed the smoothening of two samples. SEM pictures showed that erosion was from 4-47 nm, depending on the sample material and angle of incidence for debris ions. Finally, microanalysis of the exposed samples indicated that electrode material was implanted at varying depths in the samples. The erosion mechanism is explored using a spherical sector energy analyzer (ESA) to measure ion species and their energy spectra. Energy spectra for ions derived from various chamber sources are measured as a function of the Argon flow rate and angle from the centerline of the pinch. Results show creation of high energy ions (up to E = 13 keV). Species noted include ions of Xe, the buffer gas, and various electrode materials. The bulk of fast ion ejection from the pinch includes Xe⁺ which maximizes at ~8 keV followed by Xe²⁺ which maximizes at ~5 keV. Data from samples analysis and ESA measurements combined indicate mechanism and effect for debris-optic interactions and detail the effectiveness of the current debris mitigation schemes.

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