Dr. Michael Connolly Profile

Dr. Michael Connolly

at Lawrence Berkeley National Lab

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Publications (1)

Proceedings Article | 12 November 2024 Presentation + Paper

Time-dependent characterization of total electron yield and outgassing in model EUV resist materials

Bernhard Lüttgenau, Meng Zhang, Qi Zhang, Cheng Wang, Ricardo Ruiz, Michael Connolly, Oleg Kostko

Proceedings Volume 13215, 132150H (2024) https://doi.org/10.1117/12.3034401

KEYWORDS: Outgassing, Extreme ultraviolet lithography, Extreme ultraviolet, Photoacid generators, Quenching, Photoresist materials, Chemical reactions, Ions, Thin films, Polymers

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