Dr. Michael Grimbergen Profile

Dr. Michael Grimbergen

Technical Staff at Applied Materials Inc

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 21 November 2023 Poster + Paper

Identifying new absorber materials for EUV photomasks

Rebecca Stern, Michael Grimbergen, Jeff Chen, Rao Yalamanchili

Proceedings Volume 12751, 1275118 (2023) https://doi.org/10.1117/12.2686935

KEYWORDS: Etching, Extreme ultraviolet, Chemistry, Photomasks, Alloys, Thermodynamics, Plasma, Chemical elements, Plasma etching, Refractive index

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Proceedings Article | 23 October 2015 Paper

Photomask etch system and process for 10nm technology node and beyond

Madhavi Chandrachood, Michael Grimbergen, Keven Yu, Toi Leung, Jeffrey Tran, Jeff Chen, Darin Bivens, Rao Yalamanchili, Richard Wistrom, Tom Faure, Peter Bartlau, Shaun Crawford, Yoshifumi Sakamoto

Proceedings Volume 9635, 963516 (2015) https://doi.org/10.1117/12.2199030

KEYWORDS: Etching, Photomasks, Opacity, Chromium, Critical dimension metrology, Process control, Phase shifts, Photoresist processing, Line edge roughness, Phase modulation

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Proceedings Article | 1 October 2013 Paper

Model-based etch profile simulation of PSM films

Michael Grimbergen, Madhavi Chandrachood, Jeffrey Tran, Becky Leung, Keven Yu, Amitabh Sabharwal, Ajay Kumar

Proceedings Volume 8880, 88800X (2013) https://doi.org/10.1117/12.2029006

KEYWORDS: Etching, Photoresist materials, Ions, Chromium, Reactive ion etching, Model-based design, Photomasks, Solids, Plasma, Silicon

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Proceedings Article | 8 November 2012 Paper

Photomask etch: addressing the resist challenges for advanced phase-shift and binary photomasks

Michael Grimbergen, Madhavi Chandrachood, Keven Yu, Toi Yue Leung, Amitabh Sabharwal, Ajay Kumar

Proceedings Volume 8522, 85222M (2012) https://doi.org/10.1117/12.981215

KEYWORDS: Etching, Photomasks, Photoresist materials, Binary data, Data modeling, Signal processing, Plasma etching, Lithography, Wave propagation, Plasma

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Proceedings Article | 14 October 2011 Paper

Dry etching performance of advanced EUV mask blanks

John Whang, Madhavi Chandrachood, Emily Gallagher, Tom Faure, Michael Grimbergen, Shaun Crawford, Keven Yu, T. Y .B Leung, Richard Wistrom, Amitabh Sabharwal, Jeff Chen, Banqiu Wu

Proceedings Volume 8166, 81661W (2011) https://doi.org/10.1117/12.898815

KEYWORDS: Etching, Photomasks, Extreme ultraviolet, Ruthenium, Line edge roughness, Multilayers, Binary data, Manufacturing, Extreme ultraviolet lithography, Tantalum

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Proceedings Article | 6 November 2009 Paper

Plasma characterization of Tetra III chrome etch system

Michael Grimbergen, D. G. Nest, Keven Yu, T. Y. Leung, Madhavi Chandrachood, Alan Ouye, Saravjeet Singh, Ibrahim Ibrahim, Ajay Kumar, David Graves

Proceedings Volume 7488, 74880L (2009) https://doi.org/10.1117/12.833490

KEYWORDS: Plasma, Ions, Etching, Electrodes, Argon, Chlorine, Plasma etching, Emission spectroscopy, Ceramics, Ultraviolet radiation

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Proceedings Article | 11 May 2009 Paper

In situ selectivity monitor for dry etch of photomasks

Tiecheng Zhou, Jeff Chen, Michael Grimbergen, Madhavi Chandrachood, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7379, 73791T (2009) https://doi.org/10.1117/12.824305

KEYWORDS: Etching, Chromium, Photomasks, Dry etching, Photoresist processing, Algorithm development, Plasma, Refractive index, Quartz, Photoresist materials

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Proceedings Article | 11 May 2009 Paper

Plasma optical emission analysis for chamber condition monitor

Zhigang Mao, Tiecheng Zhou, Michael Grimbergen, Darin Bivens, David Knick, Renee Koch, Madhavi Chandrachood, Jeff Chen, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7379, 73791U (2009) https://doi.org/10.1117/12.824306

KEYWORDS: Plasma, Etching, Oxygen, Chromium, Chlorine, Atmospheric plasma, Spectroscopy, Photomasks, Phase modulation, Contamination

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Proceedings Article | 19 May 2008 Paper

In-situ chamber clean for chromium etch application

Zhigang Mao, Xiaoyi Chen, David Knick, Michael Grimbergen, Madhavi Chandrahood, Ibrahim Ibrahim, Ajay Kumar

Proceedings Volume 7028, 702823 (2008) https://doi.org/10.1117/12.793080

KEYWORDS: Etching, Chromium, Chemistry, Plasma, Quartz, Photomasks, Photoresist materials, Particles, Critical dimension metrology, Plasma etching

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Proceedings Article | 2 May 2008 Paper

Overcoming mask etch challenges for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6792, 67920S (2008) https://doi.org/10.1117/12.798810

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

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Proceedings Article | 30 October 2007 Paper

Overcoming loading challenges in a mask etcher for 45 nm and beyond

M. Chandrachood, T. Y. Leung, K. Yu, M. Grimbergen, S. Panayil, I. Ibrahim, A. Sabharwal, A. Kumar

Proceedings Volume 6730, 673046 (2007) https://doi.org/10.1117/12.763351

KEYWORDS: Etching, Photomasks, Chromium, Infrared search and track, Critical dimension metrology, Reactive ion etching, Optical proximity correction, Ions, Particles, Quartz

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Proceedings Article | 20 October 2006 Paper

Chrome etch solutions for 45-nm and beyond

M. Chandrachood, M. Grimbergen, I. Ibrahim, S. Panayil, A. Kumar

Proceedings Volume 6349, 634933 (2006) https://doi.org/10.1117/12.687565

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Resolution enhancement technologies, Optical proximity correction, Particles, Photoresist processing, Metrology, Infrared search and track

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Proceedings Article | 20 October 2006 Paper

Quartz etch solutions for 45-nm phase-shift masks

M. Chandrachood, M. Grimbergen, T. Y. B. Leung, S. Panayil, I. Ibrahim, A. Kumar

Proceedings Volume 6349, 634934 (2006) https://doi.org/10.1117/12.687572

KEYWORDS: Etching, Photomasks, Reactive ion etching, Quartz, Ions, Lithography, Resolution enhancement technologies, Photoresist processing, Phase shifts, Semiconducting wafers

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Proceedings Article | 20 May 2006 Paper

Chrome etch challenges for 45 nm and beyond

Madhavi Chandrachood, Michael Grimbergen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62831V (2006) https://doi.org/10.1117/12.681759

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Resolution enhancement technologies, Optical proximity correction, Photoresist processing, Particles, Plasma etching, Metrology

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Proceedings Article | 20 May 2006 Paper

Quartz etch challenges for 45 nm phase-shift masks

Scott Anderson, Madhavi Chandrachood, Michael Grimbergen, Toi Yue Becky Leung, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62831X (2006) https://doi.org/10.1117/12.681761

KEYWORDS: Etching, Photomasks, Reactive ion etching, Quartz, Lithography, Resolution enhancement technologies, Ions, Polymers, Semiconducting wafers, Phase shifts

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Proceedings Article | 19 May 2006 Paper

Photomask etch challenges for future technology nodes

Madhavi Chandrachood, Michael Grimbergen, Toi Yue Leung, Keven Yu, Renee Koch, Jeff Chen, Ibrahim Ibrahim, Sheeba Panayil, Ajay Kumar

Proceedings Volume 6283, 62830C (2006) https://doi.org/10.1117/12.684417

KEYWORDS: Etching, Photomasks, Chromium, Critical dimension metrology, Reactive ion etching, Resolution enhancement technologies, Quartz, Control systems, Plasma etching, Phase shifts

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Showing 5 of 16 publications

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