Dr. Ming L. Yu Profile

Dr. Ming L. Yu

Principal Res Scientist at First Solar Inc

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Author

Publications (4)

Proceedings Article | 28 June 2005 Paper

Exploring the fundamental limit of CD control: shot noise and CD uniformity improvement through resist thickness

Allan Sagle, Benny Buller, Ming Yu

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617058

KEYWORDS: Data modeling, Molecules, Critical dimension metrology, Lithography, Beam shaping, Chemically amplified resists, Scattering, Diffusion, Metrology, Interference (communication)

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Proceedings Article | 16 June 2005 Paper

Exploring the fundamental limit of CD control: a measurement of shot noise induced CDU in e-beam lithography

Ming Yu, Allan Sagle, Benny Buller

Proceedings Volume 5835, (2005) https://doi.org/10.1117/12.637293

KEYWORDS: Metrology, Electrons, Data modeling, Beam shaping, Molecules, Lithography, Scattering, Critical dimension metrology, Laser scattering, Electron beam lithography

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Proceedings Article | 6 May 2005 Paper

Exploring the fundamental limit of CD control: a model for shot noise in lithography

Ming L. Yu, Benny Buller, Allan Sagle

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.613661

KEYWORDS: Electrons, Molecules, Line edge roughness, Lithography, Scattering, Metrology, Critical dimension metrology, Data modeling, Backscatter, Laser scattering

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Proceedings Article | 15 October 2003 Paper

A raster multibeam lithography tool for sub-100-nm mask fabrication utilizing a novel photocathode

Mark Gesley, Timothy Thomas, Steven Coyle, Juan Maldonado, M. Scheinfein, Xiaolan Chen, Ming Yu, Douglas Holmgren, Bassam Shamoun, B. DeVore

Proceedings Volume 5220, (2003) https://doi.org/10.1117/12.512863

KEYWORDS: Photomasks, Lithography, Raster graphics, Electron beam lithography, Mask making, Modulation, Prototyping, Electron beams, Semiconducting wafers, Laser applications

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