The preliminary results of a study on the effect of the membrane deformation on the optical response of the distributed Bragg reflector, that is based on a stack of such membranes, are presented. The analysis is applied to airgap-based optical filters, which offer an enhanced refractive index contrast and hence are highly promising for optical MEMS devices. The available methods and materials in MEMS technology would make fabrication of such devices feasible, but the optical requirements impose strict geometrical implications on the membrane structure. Although (an overall) tensile stress in membrane is expected to result in a flat structure after the release, a stress gradient results in a deformed structure. A combined finite element and finite-difference time- domain method has been utilized in this work to study the effects of a stress gradient in a distributed Bragg reflector. The results on the effects of both a linear and a non-linear stress gradient are presented. It is shown that a non-linear stress profile results in twice the deformation and a further reduction of optical performance.
CMOS-compatible fabrication of thin dielectric membranes for the ultraviolet and visible spectrum is presented for use in airgap/SiO2-based interference filter design. A typical optical design consists of multiple membranes of 50-100 nm thickness. Maintaining flatness over a large area, as required by the optical application, is challenging. In such a free-standing membrane, the residual stress is the main force acting on the structure. Although an overall tensile residual stress can effectively stretch the membrane, too much stress would exceed the yield strength of the material and results in fracturing. Furthermore, the presence of a residual stress gradient causes the membrane to deform. In this work, the effect of a stress profile in the thin film has is investigated. Although PECVD SiO2 layers with an average tensile stress level of 178 MPa are used for the fabrication of the membranes, the presence of a stress gradient of about 0:67 MPa=nm results in a deformation in the membrane. A simple straining method is applied to reduce flatness. The preliminary results and discusses the challenges in the fabrication of stacked membranes for optical filters are presented.
The design of a metamaterial-based absorber for use in a MEMS-based mid-IR microspectrometer is reported. The microspectrometer consists of a LVOF that is aligned with an array of thermopile detectors, which is fabricated on a SiN membrane and coated with the absorber. Special emphasis is put on the CMOS compatible fabrication, which results in an absorber design based on Al disc resonators and an Al background plane that are separated by an SiO2 layer. Wideband operation over the 3-4 μm spectral range is achieved by staggered tuning of four Al disk resonators in one 1.5 x 1.5 μm2 unit cell, using four different values of the radius of the Al disk between 0.50 μm and 0.63 μm and an SiO2 layer thickness of 150 nm. Simulations reveal an average absorption of about 95% with a ±4% ripple at normal incidence, which reduces to about 80% absorption at a 20° incidence angle. The influence of material choice and dimensions on a single absorption peak was studied and the magnetic polariton was identified as the underlying mechanism of absorption.
A concept for a highly integrated and miniaturized gas sensor based on infrared absorption, a Fabry-Perot type linear variable optical filter with integrated gas cell, is presented. The sample chamber takes up most of the space in a conventional spectrometer and is the only component that has so far not been miniaturized. In this concept the gas cell is combined with the resonator cavity of the filter. The optical design, fabrication, and characterization results on a MEMSbased realization are reported for a 24-25.5 μm long tapered resonator cavity. Multiple reflections from highly reflective mirrors enable this optical cavity to also act as a gas cell with an equivalent optical absorption path length of 8 mm. Wideband operation of the filter is ensured by fabrication of a tapered mirror. In addition to the functional integration and significant size reduction, the filter contains no moving parts, thus enables the fabrication of a robust microspectrometer
The optical performance of a distributed Bragg reflector (DBR) is typically the determining factor in many optical MEMS devices and is mainly limited by the number of the periods (number of layers) and the refractive index contrast (RIC) of the materials used. The number of suitable available materials is limited and implementing a large number of periods increases the process complexity. Using air as a low-index material improves the RIC by almost 50% as compared with most conventional layer combinations and hence provides a higher optical performance at a given number of layers. This paper presents the design, fabrication, and optical characterization of multiple air-SiO2 Bragg reflectors with two airgap layers designed for the visible spectrum. Alternate polysilicon deposition and silicon-dioxide growth on the wafers followed by the selective etching of polysilicon layers in a TMAH-based solution results in a layer stack according to the optical design. However, unlike the conventional MEMS processes, fabrication of a blue-band airdielectric DBR demands several sacrificial layers in the range of 100 nm. Therefore, a successful release of the membrane after wet-etching is critical to the successful performance of the device. In this study, several DBRs with two periods have been fabricated using a CO2 supercritical drying process. The wide-area reflection measurements showed a peak reflectance of 65% and an FWHM of about 100 nm for a DBR centered at 500 nm. DBRs centered on 400 nm gave a much wider spectral response. This paper presents preliminary optical characterization results and discusses the challenges for a reflector design in the blue-visible range.
This paper presents the design, simulation, fabrication, and characterization of a thin-film Fabry-Perot resonator composed of titanium dioxide (TiO2) and silicon dioxide (SiO2) thin-films. The optical filter is developed to be integrated with a light emitting diode (LED) for enabling narrow-band imaging (NBI) in endoscopy. The NBI is a high resolution imaging technique that uses spectrally centered blue light (415 nm) and green light (540 nm) to illuminate the target tissue. The light at 415 nm enhances the imaging of superficial veins due to their hemoglobin absorption, while the light at 540 nm penetrates deeper into the mucosa, thus enhances the sub-epithelial vessels imaging. Typically the endoscopes and endoscopic capsules use white light for acquiring images of the gastrointestinal (GI) tract. However, implementing the NBI technique in endoscopic capsules enhances their capabilities for the clinical applications. A commercially available blue LED with a maximum peak intensity at 404 nm and Full Width Half Maximum (FWHM) of 20 nm is integrated with a narrow band blue filter as the NBI light source. The thin film simulations show a maximum spectral transmittance of 36 %, that is centered at 415 nm with FWHM of 13 nm for combined the blue LED and a Fabry Perot resonator system. A custom made deposition scheme was developed for the fabrication of the blue optical filter by RF sputtering. RF powered reactive sputtering at 200 W with the gas flows of argon and oxygen that are controlled for a 5:1 ratio gives the optimum optical conditions for TiO2 thin films. For SiO2 thin films, a non-reactive RF sputtering at 150 W with argon gas flow at 15 sccm results in the best optical performance. The TiO2 and SiO2 thin films were fully characterized by an ellipsometer in the wavelength range between 250 nm to 1600 nm. Finally, the optical performance of the blue optical filter is measured and presented.
The efficiency of a Bragg reflector design for implementation in optical resonators is highly dependent on the ratio between the high-index material and the low-index material used for the quarter-wavelength (QWOT) layers. A higher contrast implies that fewer layers are required to achieve a specified spectral selectivity over a wider spectral band. In turn, the reduced total thickness of the filter stack reduces the effect of optical absorption in the layers. The research presented here focuses on implementation of filters on top of silicon detectors that are already fabricated in a CMOS process. This implies that the constraints of process compatibility, such as the materials to be used, process temperature and cleanroom reentrance related to contamination, need to be considered. Silicon-dioxide is often used in CMOS-compatible designs, which has an index of refraction n~1.5, thus limiting nHi/nLo to about 2. This value can be improved by 50% when using air-films as the low-n material. Surface micromachining is used for the fabrication of such mirrors. Multiple layers of Si and SiO2 were alternatingly deposited, and subsequently the Si layers are selectively removed in a sacrificial etch. The width of the λ/4 air-gaps is about 100 nm, which is narrower as compared to the typical layer thickness that is used in surface micromachining for conventional MEMS applications. Moreover, a demanding optical design requires more layers than typically used in a conventional MEMS device. Since the number of stacked layers is significantly higher as compared to the conventional MEMS, fabricating such filters is a challenge. However, unlike a conventional MEMS, electrical contacting to the structural layers is not required in optical filter application, which, eases the fabrication of such filters. This paper presents the design of several 4-layer structures for use in the visible spectral range, along with the fabrication sequence and preliminary measurement results.
This paper presents the design, fabrication and characterization of a linear variable optical filter (LVOF) that operates in the infrared (IR) spectral range. An LVOF-based microspectrometer is a tapered-cavity Fabry-Perot optical filter placed on top of a linear array of detectors. The filter transforms the optical spectrum into a lateral intensity profile, which is recorded by the detectors. The IR LVOF has been fabricated in an IC-compatible process flow using a resist reflow and is followed by the transfer etching of this resist pattern into the optical resonator layer. This technique provides the possibility to fabricate a small, robust and high-resolution micro-spectrometer in the IR spectral range directly on a detector chip. In these designs, the LVOF uses thin-film layers of sputtered Si and SiO2 as the high and low refractive index materials respectively. By tuning the deposition conditions and analyzing the optical properties with a commercial ellipsometer, the refractive index for Si and SiO2 thin-films was measured and optimized for the intended spectral range. Two LVOF microspectrometers, one operating in the 1.8-2.8 μm, and the other in the 3.0-4.5 μm wavelength range, have been designed and fabricated on a silicon wafer. The filters consist of a Fabry-Perot structure combined with a band-pass filter to block the out-of-band transmission. Finally, the filters were fully characterized with an FTIR spectrometer and the transmission curve widening was investigated. The measured transmittance curves were in agreement with theory. The characterization shows a spectral resolution of 35-60 nm for the short wavelength range LVOF and 70 nm for the long wavelength range LVOF, which can be further improved using signal processing algorithms.
In this paper, we have introduced a method for design and fabrication of a micro-windmill based on SU-8 photoresist
that is rotated by gas flow. This device is used for measuring gas flow by assessment of rotational speed of the microwindmill.
The flow-meter sensitivity is influenced by different parameters such as number of blades and dimension of
the windmills. Therefore, we have tried to experimentally reduce the dimensions and increase of the number of blades to
obtain the higher sensitivity in measuring gas flow. An experimental setup is arranged to measure the rotational
frequency of the windmill as a function of gas flow with optical methods.
Many applications in micro and nanotechnologies require micron-sized components, capable of positioning in
ranges of sub-micrometers to a few microns. This paper reports on the design, fabrication and characterization procedure
of an electrostatically actuated polymeric Nano-precision micro z-stage. Due to its ease of fabrication and great variety
of functionalities, polymers have become an important material in micro fabrication technology. In contrast to
piezoelectric stages, polymeric micro stage has a comparatively simple and cost effective fabrication procedure.
Furthermore, low Young's Modulus of polymers made them a suitable basic material in comparison with their traditional
counterparts. In this paper, SU-8 photoresist was used as the construction material and the photolithography technique
were used to realize the stage. SU-8 with its low Young's modulus (5 GPa), has a higher tendency for bending,
compared to, for example, silicon nitride (150-350 GPa). These properties make the SU-8 polymer, suitable for various
applications.
In this paper we have explained a new method for measuring the cantilever displacement using both reflective
and interferometric properties of the cantilever. In our method, a Laser light is shone on the cantilever, and the reflected
pattern is monitored by a commercially available CCD. Due to the micrometer dimensions of the cantilever which was
smaller than the spot size of the laser, the laser beam would be reflected by both substrate and the cantilever's surface,
and this will produce an interference pattern on the screen. In this configuration, a displacement in the cantilever will
reflect the light in a different angle and also changes the optical path difference between the reflected light from the
cantilever and substrate. The overall result of these two effects would be a total displacement of the pattern, which could
be simply measured using a CCD. Finally, by taking both effects into consideration,, the cantilever's displacement could
be measured. For testing this technique different cantilevers were fabricated and were electrostatically actuated. In this
method, displacements as small as 10nm were possible to measure.
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