Dr. Niamh Waldron Profile

Dr. Niamh Waldron

at imec

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Publications (1)

Proceedings Article | 20 March 2019 Paper

Fabrication challenges and opportunities for high-mobility materials: from CMOS applications to emerging derivative technologies

N. Collaert, A. Alian, B. De Jaeger, U. Peralagu, A. Vais, A. Walke, L. Witters, H. Yu, E. Capogreco, K. Devriendt, T. Hopf, K. Kenis, G. Mannaert, A. Milenin, A. Peter, F. Sebaai, L. Teugels, D. van Dorp, K. Wostyn, N. Horiguchi, N. Waldron

Proceedings Volume 10963, 1096305 (2019) https://doi.org/10.1117/12.2511746

KEYWORDS: Germanium, Gallium nitride, Gallium arsenide, CMOS technology, Field effect transistors, Fin field effect transistors, Group III-V semiconductors

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