In this study, we present a novel approach combining nano-scale imprint lithography (NIL) and reactive ion etching (RIE) to fabricate high-quality surface relief gratings (SRGs). This study provides valuable insights into the challenges and optimizations in fabricating SRGs from TiO2 layers using the combination of NIL and RIE. The work was performed with SCHOTT RealView® substrates coated with a 100 nm TiO2 layer and a NIL mask with pattern widths of 200 nm and a pitch of 400 nm. The substrates were processed using the SmartNIL® method to prepare the NIL mask. The advantage of removing the residual layer before the actual structuring of the TiO2 using argon plasma was demonstrated in our research. This led to a significant increase in the selectivity between TiO2 and the NIL resist UV/OA R18. Through the employment of a two-step etching process, which involved the removal of the residual layer with argon plasma and the use of a BCl3-based reactive process with high ion energy, TiO2 structures with a height of 100 nm and a sidewall angle of 75° were successfully created. An effective selectivity of 0.84 was achieved for this two-step process.
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