CONFERENCE PROCEEDINGS
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Nobuji Matsumura
at JSR Engineering Co Ltd
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Author
Publications (3)
Proceedings Article | 1 April 2009 Paper
Non-topcoat process development for ArF immersion lithography
Shiro Kusumoto, Hiroshi Arima, Yuichi Yoshida, Tsuyoshi Shibata, Akimasa Soyano, Takehiko Naruoka, Nobuji Matsumura, Yoshikazu Yamaguchi, Kousuke Yoshihara
Proceedings Volume 7273, 727328 (2009) https://doi.org/10.1117/12.814084
KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness
Proceedings Article | 4 April 2008 Paper
Process development for high scan speed ArF immersion lithography
Hideharu Kyoda, Hirofumi Takeguchi, Nobuji Matsumura, Tomoharu Fujiwara, Koichi Fujiwara, Hirokazu Tanizaki, Shinya Wakamizu, Yoshikazu Yamaguchi, Norihiko Sugie, Hiroshi Arima, Junichi Kitano, Kosuke Yoshihara, Katsushi Nakano, Kentaro Goto
Proceedings Volume 6923, 69230D (2008) https://doi.org/10.1117/12.771795
KEYWORDS: Lithography, Immersion lithography, Thin film coatings, 193nm lithography, Semiconducting wafers, Bridges, Defect inspection, Photoresist processing, Line width roughness, Semiconductors
Proceedings Article | 29 March 2006 Paper
Performance comparison of chemically amplified resists under EUV, EB, and KrF exposure
Tsutomu Shimokawa, Yoshikazu Yamaguchi, Toshiyuki Kai, Nobuji Matsumura, Koichi Fujiwara, Daisuke Shimizu
Proceedings Volume 6153, 615344 (2006) https://doi.org/10.1117/12.656097
KEYWORDS: Extreme ultraviolet lithography, Line width roughness, Chemically amplified resists, Photoresist materials, Extreme ultraviolet, Lithography, Ionization, Silver, Electron beam lithography, Electron beams
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