Dr. Owen Huang
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 22 February 2021 Presentation
Folarin Latinwo, Yulu Chen, Delian Yang, Rob DeLancey, Owen Huang, Kevin Lucas
Proceedings Volume 11613, 116130F (2021) https://doi.org/10.1117/12.2584781
KEYWORDS: Photoresist materials, Photoresist developing, Optical proximity correction, Optical lithography, Semiconductors, Polymers, Physics, Photoresist processing, Pollution control, Logic

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