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Paul A. Nyhus
Principal Engineer at Intel Corp
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Publications (1)
Proceedings Article | 20 March 2015 Paper
Material readiness for generation 2 directed self-assembly (DSA) < 24nm pitch
Eungnak Han, Todd Younkin, Manish Chandhok, Alan Myers, Tristan Tronic, Florian Gstrein, Kranthi Elineni, Ashish Gaikwad, Paul Nyhus, Praveen Setu, Charles Wallace
Proceedings Volume 9425, 94250O (2015) https://doi.org/10.1117/12.2086094
KEYWORDS: Etching, Photoresist developing, Wet etching, Scanning electron microscopy, Polymethylmethacrylate, Annealing, Dry etching, Photoresist materials, Picosecond phenomena, Directed self assembly
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