Dr. Manish Chandhok
Senior CAD Engineer at Intel Corp
SPIE Involvement:
Author
Publications (38)

Proceedings Article | 20 March 2015 Paper
Eungnak Han, Todd Younkin, Manish Chandhok, Alan Myers, Tristan Tronic, Florian Gstrein, Kranthi Elineni, Ashish Gaikwad, Paul Nyhus, Praveen Setu, Charles Wallace
Proceedings Volume 9425, 94250O (2015) https://doi.org/10.1117/12.2086094
KEYWORDS: Etching, Photoresist developing, Wet etching, Scanning electron microscopy, Polymethylmethacrylate, Annealing, Dry etching, Photoresist materials, Picosecond phenomena, Directed self assembly

Proceedings Article | 14 October 2011 Paper
Proceedings Volume 8166, 816618 (2011) https://doi.org/10.1117/12.895149
KEYWORDS: Photomasks, Phase shifts, Extreme ultraviolet, Reflectivity, Phase shifting, Semiconducting wafers, Refractive index, Lithography, Binary data, Extreme ultraviolet lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 79722S (2011) https://doi.org/10.1117/12.881675
KEYWORDS: Line width roughness, Critical dimension metrology, Scanning electron microscopy, Annealing, Surface roughness, Carbon dioxide lasers, Chemically amplified resists, Laser development, Atomic force microscopy, Optical lithography

Proceedings Article | 16 April 2011 Paper
Proceedings Volume 7972, 797219 (2011) https://doi.org/10.1117/12.879288
KEYWORDS: Diffusion, Carbon dioxide lasers, Extreme ultraviolet lithography, Temperature metrology, Annealing, Deep ultraviolet, Lithography, Chemically amplified resists, Polymers, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79691R (2011) https://doi.org/10.1117/12.879428
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Cadmium sulfide, Extreme ultraviolet, Line width roughness, Lithography, Reflection, Electroluminescence, Phase shifting, Semiconducting wafers

Proceedings Article | 8 April 2011 Paper
Proceedings Volume 7969, 79692K (2011) https://doi.org/10.1117/12.879641
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Photoresist processing, Photoresist materials, Photoresist developing, Materials processing, Lithography, Etching, Scanning electron microscopy

Proceedings Article | 5 April 2011 Paper
Proceedings Volume 7969, 79690G (2011) https://doi.org/10.1117/12.884790
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Binary data, Etching, Semiconducting wafers, Line width roughness, Phase shifts, Optical lithography, Printing, Image resolution

Proceedings Article | 26 March 2010 Paper
Byungki Jung, Jing Sha, Florencia Paredes, Christopher Ober, Michael Thompson, Manish Chandhok, Todd Younkin
Proceedings Volume 7639, 76390L (2010) https://doi.org/10.1117/12.848418
KEYWORDS: Diffusion, Deep ultraviolet, Carbon dioxide lasers, Polymers, Annealing, Imaging systems, Extreme ultraviolet lithography, Chemically amplified resists, Temperature metrology, Absorption

Proceedings Article | 20 March 2010 Paper
Proceedings Volume 7636, 76360P (2010) https://doi.org/10.1117/12.842408
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Standards development, Lithography, Photoresist processing, Optical lithography, Photoresist materials, Lithographic illumination, Lead

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72731L (2009) https://doi.org/10.1117/12.814191
KEYWORDS: Line width roughness, Extreme ultraviolet, Extreme ultraviolet lithography, Polymers, Photoresist processing, Standards development, Optical lithography, Glasses, Lithography, Photoresist materials

Proceedings Article | 1 April 2009 Paper
Proceedings Volume 7273, 72733U (2009) https://doi.org/10.1117/12.813555
KEYWORDS: Diffusion, Photoresist materials, Extreme ultraviolet lithography, Switches, Lithography, Line edge roughness, Photoresist developing, Polymers, Deep ultraviolet, Extreme ultraviolet

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 727116 (2009) https://doi.org/10.1117/12.814436
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Inspection, Optical lithography, Extreme ultraviolet, Particles, Photoresist materials, Line width roughness, Reticles, Semiconducting wafers

Proceedings Article | 18 March 2009 Paper
Manish Chandhok, Sanjay Goyal, Steven Carson, Seh-Jin Park, Guojing Zhang, Alan Myers, Michael Leeson, Marilyn Kamna, Fabian Martinez, Alan Stivers, Gian Lorusso, Jan Hermans, Eric Hendrickx, Sanjay Govindjee, Gerd Brandstetter, Tod Laursen
Proceedings Volume 7271, 72710G (2009) https://doi.org/10.1117/12.814428
KEYWORDS: Extreme ultraviolet, Photomasks, Finite element methods, Reticles, Error analysis, Thin films, Photovoltaics, Data modeling, Distortion, Image registration

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222C (2008) https://doi.org/10.1117/12.801542
KEYWORDS: Extreme ultraviolet lithography, Photomasks, Metrology, Thin films, Personal protective equipment, Distortion, Image registration, Thin film deposition, Extreme ultraviolet, Reticles

Proceedings Article | 21 March 2008 Paper
B. Yakshinskiy, M. Hedhili, S. Zalkind, M. Chandhok, Theodore Madey
Proceedings Volume 6921, 692114 (2008) https://doi.org/10.1117/12.772798
KEYWORDS: Oxygen, Ruthenium, Carbon, Telescopic pixel displays, Adsorption, Extreme ultraviolet, Extreme ultraviolet lithography, Photons, Contamination, Titanium dioxide

Proceedings Article | 20 March 2008 Paper
Proceedings Volume 6921, 692118 (2008) https://doi.org/10.1117/12.772653
KEYWORDS: Reflectivity, Multilayers, Mirrors, Extreme ultraviolet lithography, Silicon, Carbon, Molybdenum, Extreme ultraviolet, Oxidation, Titanium dioxide

Proceedings Article | 12 April 2007 Paper
Proceedings Volume 6519, 651943 (2007) https://doi.org/10.1117/12.712407
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Photoresist developing, Extreme ultraviolet, Optical lithography, Scanning electron microscopy, Standards development, Systems modeling, Performance modeling

Proceedings Article | 22 March 2007 Paper
Manish Chandhok, Suman Datta, Daniel Lionberger, Scott Vesecky
Proceedings Volume 6519, 65191A (2007) https://doi.org/10.1117/12.712955
KEYWORDS: Line width roughness, Critical dimension metrology, Transistors, Photomasks, Cadmium, Ions, Etching, Optical lithography, Metals, Molybdenum

Proceedings Article | 19 March 2007 Paper
S. Hill, I. Ermanoski, C. Tarrio, T. Lucatorto, T. Madey, S. Bajt, M. Fang, M. Chandhok
Proceedings Volume 6517, 65170G (2007) https://doi.org/10.1117/12.712286
KEYWORDS: Reflectivity, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Carbon, Silicon, Ruthenium, Electrons, Ions, Oxidation

Proceedings Article | 13 March 2007 Paper
Anne Marie Goethals, Rik Jonckheere, Gian Francesco Lorusso, Jan Hermans, Frieda Van Roey, Alan Myers, Manish Chandhok, Insung Kim, Ardavan Niroomand, Fumio Iwamoto, Nikolay Stepanenko, Roel Gronheid, Bart Baudemprez, Kurt Ronse
Proceedings Volume 6517, 651709 (2007) https://doi.org/10.1117/12.710798
KEYWORDS: Extreme ultraviolet, Reticles, Extreme ultraviolet lithography, Photomasks, Line edge roughness, Point spread functions, Scanners, Lithography, Printing, Critical dimension metrology

Proceedings Article | 20 May 2006 Paper
Proceedings Volume 6283, 62830G (2006) https://doi.org/10.1117/12.681839
KEYWORDS: Photomasks, Extreme ultraviolet, Etching, Reflectivity, Defect inspection, Extreme ultraviolet lithography, Inspection, Ruthenium, Image processing, Optical lithography

Proceedings Article | 24 March 2006 Paper
Proceedings Volume 6151, 61512V (2006) https://doi.org/10.1117/12.657695
KEYWORDS: Extreme ultraviolet lithography, Lithography, Lithographic illumination, Extreme ultraviolet, Semiconducting wafers, EUV optics, Optical lithography, Light sources, Cadmium sulfide, Logic

Proceedings Article | 23 March 2006 Paper
Proceedings Volume 6151, 61510F (2006) https://doi.org/10.1117/12.656502
KEYWORDS: Mirrors, Extreme ultraviolet, Reflectivity, Carbon monoxide, Extreme ultraviolet lithography, Molecules, EUV optics, Carbon, Reflectometry, Synchrotrons

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600154
KEYWORDS: Extreme ultraviolet, Point spread functions, Mirrors, Extreme ultraviolet lithography, Photomasks, Scattering, Wavefronts, Lithography, Deep ultraviolet, Light scattering

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.604870
KEYWORDS: Critical dimension metrology, Lithography, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Control systems, Photomasks, Data modeling, Cadmium, Projection systems

Proceedings Article | 6 May 2005 Paper
Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600259
KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Semiconducting wafers, Reflectivity, Reticles, Mirrors, Light sources, Plasma, Mask making

Proceedings Article | 4 May 2005 Paper
Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600214
KEYWORDS: Line width roughness, Extreme ultraviolet, Optical lithography, Absorbance, Scatterometry, Scanning electron microscopy, Lithography, Scatter measurement, Image resolution, Extreme ultraviolet lithography

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537311
KEYWORDS: Extreme ultraviolet, Mirrors, Projection systems, Extreme ultraviolet lithography, Polishing, Lithography, Scattering, Critical dimension metrology, Deep ultraviolet, Photomasks

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535959
KEYWORDS: Absorbance, Reflectivity, Photoresist materials, Semiconducting wafers, Silicon, Extreme ultraviolet, Grazing incidence, Refraction, Extreme ultraviolet lithography, X-rays

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535995
KEYWORDS: Point spread functions, Modulation transfer functions, Mirrors, Extreme ultraviolet lithography, Critical dimension metrology, Spatial frequencies, Extreme ultraviolet, Optical proximity correction, Fourier transforms, Deep ultraviolet

Proceedings Article | 20 May 2004 Paper
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536024
KEYWORDS: Critical dimension metrology, Mirrors, Point spread functions, Nanoimprint lithography, Cadmium, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Polishing, Spatial frequencies

Proceedings Article | 20 May 2004 Paper
Michael Shumway, Eric Snow, Kenneth Goldberg, Patrick Naulleau, Heidi Cao, Manish Chandhok, James Liddle, Erik Anderson, Jeffrey Bokor
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.535666
KEYWORDS: Semiconducting wafers, Extreme ultraviolet, Gold, Photomasks, Spatial filters, Line edge roughness, Printing, Wafer-level optics, Extreme ultraviolet lithography, Spatial frequencies

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536041
KEYWORDS: Line width roughness, Photoresist materials, Polymers, Diffusion, Molecules, Extreme ultraviolet, Line edge roughness, Scanning electron microscopy, Lithography, Edge roughness

Proceedings Article | 14 May 2004 Paper
Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536021
KEYWORDS: Line width roughness, Photoresist materials, Extreme ultraviolet, Extreme ultraviolet lithography, Absorbance, Optical lithography, Lithography, Line edge roughness, Polymers, Manufacturing

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.485547
KEYWORDS: Mirrors, Extreme ultraviolet, Projection systems, Point spread functions, Lithography, Wavefronts, Spatial frequencies, Extreme ultraviolet lithography, Polishing, Surface roughness

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.482344
KEYWORDS: Photomasks, Critical dimension metrology, Point spread functions, Chromium, Cadmium, Optical proximity correction, Extreme ultraviolet, Extreme ultraviolet lithography, Convolution, Mirrors

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485162
KEYWORDS: Line width roughness, Line edge roughness, Photoresist processing, Semiconducting wafers, Critical dimension metrology, Silicon, Lithography, Ultrasonics, Ultrasonography, Edge roughness

Proceedings Article | 12 June 2003 Paper
Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485095
KEYWORDS: Extreme ultraviolet, Line width roughness, Absorbance, Photoresist materials, Extreme ultraviolet lithography, Photoresist developing, Optical lithography, Lithography, Polymers, Line edge roughness

Showing 5 of 38 publications
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