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Pengzhi Wei
at Beijing Institute of Technology
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Author
Publications (4)
Proceedings Article | 13 December 2021 Paper
Lithographic exposure latitude aware source and mask optimization
Proceedings Volume 12073, 1207302 (2021) https://doi.org/10.1117/12.2604844
KEYWORDS: Source mask optimization, Photomasks, Lithography, Resolution enhancement technologies, Semiconducting wafers, Lithium, Image processing, Electroluminescence, Optical proximity correction, Lithographic illumination
Proceedings Article | 13 December 2021 Paper
Comprehensive and quantitative characterization and analysis method of 3D mask effect for lithography simulation
Proceedings Volume 12073, 120730F (2021) https://doi.org/10.1117/12.2604846
KEYWORDS: Photomasks, Polarization, 3D modeling, Lithography, Projection systems, Analytical research, Fourier transforms
Proceedings Article | 1 November 2021 Paper
Comparison of sparse-based full chip source optimization with different bases
Proceedings Volume 12057, 120570J (2021) https://doi.org/10.1117/12.2604075
KEYWORDS: Lithography, Resolution enhancement technologies, Optimization (mathematics), Optical lithography, Imaging systems
Proceedings Article | 1 November 2021 Paper
Simulations of impacts on aerial image performance of defocus on different resolution enhancement technologies
Proceedings Volume 12057, 1205747 (2021) https://doi.org/10.1117/12.2606845
KEYWORDS: Lithography, Resolution enhancement technologies, Photomasks, Source mask optimization, Semiconducting wafers, Polarization, Systems modeling, Image processing, Image enhancement, Thermal effects
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