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Dr. Peter Wang
at Onto Innovation Inc
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 27 April 2023 Presentation + Paper
Measurement of W-recess profile in advanced node 3D NAND device with IRCD technology utilizing a specialized design-rule compliant target
Nick Keller, Zhuo Chen, Peter Wang, Rostislav Grynko, Troy Ribaudo, G. Andrew Antonelli, Youcheng Wang, Joshua Frederick, Sadao Takabayashi, John Hauck, Dan Engelhard
Proceedings Volume 12496, 124961Z (2023) https://doi.org/10.1117/12.2657719
KEYWORDS: Simulations, Metals, Finite-difference time-domain method, 3D acquisition, 3D metrology, Semiconducting wafers, Etching, Electric fields, Dielectrics, Plasmonics
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