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Philipp Meixner
Field Application Engineer at ASML Korea Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Metrology Overlay , Process Control Overlay
Publications (1)
Proceedings Article | 13 March 2018 Paper
Improved control of multi-layer overlay in advanced 8nm logic nodes
Tae-Sun Kim, Young-Sik Park, Yong-Chul Kim, Byoung-Hoon Kim, Ji-Hun Lee, Min-Keun Kwak, Sung-Won Choi, Joon-Soo Park, Hong-Cheon Yang, Philipp Meixner, Dong-jin Lee, Oh-Sung Kwon, Hyun-Su Kim, Jin-Tae Park, Sung-Min Lee, Cedric Grouwstra, Vidar van der Meijden, Mohamed El Kodadi, Chris Kim, Pierre-Yves Guittet, Tjitte Nooitgedagt
Proceedings Volume 10585, 1058527 (2018) https://doi.org/10.1117/12.2297099
KEYWORDS: Semiconducting wafers, Scanning electron microscopy, Overlay metrology, Logic, Metrology, Diffraction, Target acquisition, Performance modeling, Diffraction gratings
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