Dr. Po-Sheng Wang Profile

Dr. Po-Sheng Wang

at Taiwan Mask Corp

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Author

Publications (6)

Proceedings Article | 20 November 2024 Poster + Paper

Productivity-enhanced mask inspection application for mature node coverage

Maxwel Lee, Eric Wang, Ken Yang, Colbert Lu, Elton Lin, Connie Lin, Pei-Ying Lin, Adrian Li, Dongsheng Fan

Proceedings Volume 13216, 132162B (2024) https://doi.org/10.1117/12.3034607

KEYWORDS: Inspection, Industry, Manufacturing, Semiconductors, Particles, Optical proximity correction, Lead, Artificial intelligence, Mask making, Reticles, Defect inspection, Optical inspection, Inspection equipment

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Proceedings Article | 26 August 2024 Paper

Enhancement of mask data verification with Smart-MRC and machine learning

Fei-Lin Liu, Shu-Yi Chou, Chi-Ian Ip, Hui-Min Leong, Min-Ru Wei, Po-Sheng Wang, Liang-Chieh Lin, Saghir Munir

Proceedings Volume 13177, 131770X (2024) https://doi.org/10.1117/12.3034282

KEYWORDS: Data conversion, Machine learning, Inspection, Electronic design automation, Manufacturing, Photomasks, Data modeling, Education and training, Image classification, Data processing

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Proceedings Article | 22 November 2023 Poster

The process-footprint and density-dependent errors correction of laser mask pattern generator with software-based data path for cd uniformity improvement

Hsiang Jen Yang, Po-Sheng Wang, Yen-Hao Chen, Sheng-Hsin Sun, Ting-Ching Hu, Chia-Wei Lin, Lance Lin

Proceedings Volume PC12751, PC127510X (2023) https://doi.org/10.1117/12.2687188

KEYWORDS: Critical dimension metrology, Beam path, Error control coding, Photoresist materials, Integration, Etching, Design and modelling

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Proceedings Article | 29 September 2023 Paper

Sidewall angle calculation on CD-SEM metrology

WenWei Lee, HsiangJen Yang, Po-Sheng Wang

Proceedings Volume 12915, 129150O (2023) https://doi.org/10.1117/12.2685008

KEYWORDS: Transmission electron microscopy, Photomasks, 3D modeling, Metrology, 3D metrology, Scanning electron microscopy, 3D image processing, Industry, 3D mask effects, Semiconducting wafers

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Proceedings Article | 16 September 2022 Paper

Enhancement of the proximity and aerial imaging performance of a software-based data path for raster-scanned multi-beam laser writer

Hsiang Jen Yang, Po Sheng Wang, Chun Chieh Han, Yi Min Lin, Wen Wei Lee, Wei Shen Chen

Proceedings Volume 12325, 123250T (2022) https://doi.org/10.1117/12.2640527

KEYWORDS: Photomasks, Raster graphics, Reticles

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Proceedings Article | 16 September 2022 Poster + Paper

The application of mask data preparation on KLA DB inspection

Fei-Lin Liu, Po-Hsiang Yang, Liang-Chieh Lin, Po-Sheng Wang

Proceedings Volume 12325, 123250U (2022) https://doi.org/10.1117/12.2640662

KEYWORDS: Inspection, Calibration, Algorithm development, Reticles, Manufacturing, Optical simulations, Image transmission, Diffusion, Data conversion

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Showing 5 of 6 publications

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