QiXin Xu
at Siemens EDA
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 March 2020 Paper
Proceedings Volume 11328, 113281A (2020) https://doi.org/10.1117/12.2551670
KEYWORDS: Source mask optimization, Design for manufacturing, Manufacturing, Extreme ultraviolet lithography, Design for manufacturability, Optical lithography, Image processing, Neptune, Adaptive optics, Critical dimension metrology

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