Mr. Russell J. Boten Profile

Russell J. Boten

Photolithography Manager at WaferTech LLC

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 29 March 2006 Paper

Development of optimized filter for TARC and developer with the goal of having small pore size and minimizing microbubble reduction

Toru Umeda, Shuichi Tsuzuki, Mikal Boucher, Hung Dinh, L. Ma, Russell Boten

Proceedings Volume 6153, 61534L (2006) https://doi.org/10.1117/12.656399

KEYWORDS: Phase modulation, Particles, Optical filters, Semiconducting wafers, Photoresist materials, Photoresist processing, Adsorption, Resistance, Photoresist developing, Interfaces

Read Abstract +

Microbubble in filtering Tetra Methyl Ammonium Hydroxide (TMAH) were counted to find the filter which generates the lowest microbubble in resist development process. Hydrophilic Highly Asymmetric Poly Aryl Sulfone (HAPAS) filter was developed and tested. The result showed that generation of microbubbles was as low as that of the Nylon 6,6 filter which had the best performance to date. Microbubbles in TARC are counted using the same method as the developer testing described above except for mainstream flow rate and the counter model. The results show that counts in the small channel could be reduced by smaller pore size filter such as conventional 0.02um rated filter. However, counts in the larger channel could be reduced by larger pore size filter such as 0.1um rated filter. Based on the above results, 0.02um rated asymmetric nylon 6,6 filter was developed. As a result, 0.02um rated asymmetric Nylon 6,6 filter achieved relatively lower count at any channel as compared to the standard 0.04um rated Nylon 6,6 filter. Nylon 6,6 filters were installed in resist as an improvement for preventive maintenance (PM) at Wafertech, L.L.C. instead of the currently used filter which has more hydrophobic membrane material. Using the Nylon 6,6 membrane, the number of defects immediately after filter change greatly decreased from 493 pcs of the more hydrophobic filter to 6 pcs/wafer, then after purging with about 250ml, the number of defects reduced within the process specification while the more hydrophobic filter had required 2L purging and 12-36 hours of PM time.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years