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Dr. Russell Burdt
at Cymer LLC
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Author
Publications (1)
Proceedings Article | 31 March 2014 Paper
Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography
R. Burdt, J. Thornes, T. Duffey, T. Bibby, R. Rokitski, E. Mason, J. Melchior, T. Aggarwal, D. Haran, J. Wang, G. Rechtsteiner, M. Haviland, D. Brown
Proceedings Volume 9052, 90522K (2014) https://doi.org/10.1117/12.2048082
KEYWORDS: Light sources, Semiconducting wafers, Lithography, Semiconductors, Scanners, Light, Optical amplifiers, Switching, Optical lithography, Near field optics
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