Mr. Joshua J. Thornes Profile

Joshua J. Thornes

Director of Marketing at ASML

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 11 November 2022 Presentation

Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource

Siqi Luo, Will Conley, James Bonefede, Natallia Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar Rao, marc sells, Josh thornes

Proceedings Volume PC12293, PC122930H (2022) https://doi.org/10.1117/12.2648306

KEYWORDS: Yield improvement, Speckle, Light sources, Helium

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Proceedings Article | 25 March 2020 Presentation

Multi-focal imaging for improved depth of focus; principles and application to ArFi use cases (Conference Presentation)

Will Conley, Josh Thornes, Paolo Alagna, Omar Zurita, Kuo-Tai Teng, Stephen Hsu, Xiang-ru Xu, Sam Liu

Proceedings Volume 11327, 113270P (2020) https://doi.org/10.1117/12.2552505

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Over the years, lithography engineers have continued to focus on CD control, overlay and process capability to meet node requirements for yield and device performance. The use of ArFi lithography for advanced process nodes demands challenging patterning budget improvements in the sub-nm range.1 In 3D NAND devices, the height differences between the cell and periphery create issues with the ability to adequately image and maintain a useable process window in both regions. Previous work by Fukuda2 developed a multi-exposure technique at multi-focus positions to image contact holes with adequate DOF. Lalovic3 demonstrated a fixed 2 wavelength technique to improve DOF called RELAX. ASML introduced EFESE Rx, a method of tilting the stage during exposure to create multiple focus positions and finally Lalovic4 introduced a broadband laser solution to provide additional DOF. All of these techniques suffered from a number of problems that limited usability. In this work the authors will introduce a new method to increase DOF through alternating wavelength’s from an ArFi light source. This technique, called MFI (multi-focal imaging), can be tuned specifically to provide the required amount of wavelength separation for a specific DOF need. Two focal positions are created that are averaged over the exposure field. The authors will review this wavelength “dithering” approach which can be turned on and off, thus eliminating any potential scanner calibration issues. Initial simulation studies with a fixed source and mask indicated increased DOF with wavelength separation. These DOF improvements have been confirmed with on-wafer single-exposure data. The Tachyon MFI aware engine flow will be reviewed using several customer use cases that have been analyzed to demonstrate maximum DOF and ILS vs wavelength separation. The authors will also review the optimization of new pupils and OPC solutions that are unique with each wavelength separation case and maximize process capability. The presentation will close with a product availability timeline and roadmap.

Proceedings Article | 20 March 2018 Presentation

Advanced light source technologies for memory and logic processes (Conference Presentation)

Theodore Cacouris, Josh Thornes, Marc Sells, Aleks Simic, Will Conley

Proceedings Volume 10587, 105870Y (2018) https://doi.org/10.1117/12.2298431

KEYWORDS: Light sources, Logic, Deep ultraviolet, Optical lithography, Immersion lithography, 3D metrology, Photomasks

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Proceedings Article | 15 March 2016 Paper

Neon reduction program on Cymer ArF light sources

Dinesh Kanawade, Yzzer Roman, Ted Cacouris, Josh Thornes, Kevin O'Brien

Proceedings Volume 9780, 97801H (2016) https://doi.org/10.1117/12.2219942

KEYWORDS: Neon, Light sources, Excimer lasers, Chemical elements, Lithography, Excimers, Deep ultraviolet, Semiconductors, Halogens, Fluorine, Molybdenum

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Proceedings Article | 18 March 2015 Paper

Performance of ETC controller in high-volume production

Joshua Thornes, Kevin O'Brien, Hoang Dao, David Dunlap, Ronnie Flores, Matt Lake, Aleks Simic, Brian Wehrung, John Wyman, Will Conley

Proceedings Volume 9426, 942625 (2015) https://doi.org/10.1117/12.2086102

KEYWORDS: Semiconducting wafers, Light sources, Control systems, Lithography, Yield improvement, Manufacturing, Scanners, Cadmium sulfide, Optical lithography, Overlay metrology

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Proceedings Article | 18 March 2015 Paper

New ArF immersion light source introduces technologies for high-volume 14nm manufacturing and beyond

T. Cacouris, W. Conley, J. Thornes, T. Bibby, J. Melchior, T. Aggarwal, E. Gross

Proceedings Volume 9426, 942618 (2015) https://doi.org/10.1117/12.2085968

KEYWORDS: Light sources, Helium, Lithography, Optical lithography, Deep ultraviolet, Critical dimension metrology, Control systems, Manufacturing, Molybdenum, Semiconductors

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Proceedings Article | 31 March 2014 Paper

Improvements in bandwidth and wavelength control for XLR 660xi systems

Will Conley, Hoang Dao, David Dunlap, Ronnie Flores, Matt Lake, Kevin O'Brien, Alicia Russin, Aleks Simic, Josh Thornes, Brian Wehrung, John Wyman

Proceedings Volume 9052, 90521H (2014) https://doi.org/10.1117/12.2048305

KEYWORDS: Light sources, Control systems, Semiconducting wafers, Yield improvement, Lithography, Algorithm development, Scanners, Overlay metrology, Systems modeling, Cadmium sulfide

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Proceedings Article | 31 March 2014 Paper

Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

R. Burdt, J. Thornes, T. Duffey, T. Bibby, R. Rokitski, E. Mason, J. Melchior, T. Aggarwal, D. Haran, J. Wang, G. Rechtsteiner, M. Haviland, D. Brown

Proceedings Volume 9052, 90522K (2014) https://doi.org/10.1117/12.2048082

KEYWORDS: Light sources, Semiconducting wafers, Lithography, Semiconductors, Scanners, Light, Optical amplifiers, Switching, Optical lithography, Near field optics

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Proceedings Article | 12 April 2013 Paper

Lithography imaging control by enhanced monitoring of light source performance

Paolo Alagna, Omar Zurita, Ivan Lalovic, Nakgeuon Seong, Gregory Rechsteiner, Joshua Thornes, Koen D'havé, Lieve Van Look , Joost Bekaert

Proceedings Volume 8683, 86830S (2013) https://doi.org/10.1117/12.2013213

KEYWORDS: Semiconducting wafers, Lithography, Optical lithography, Metrology, Polarization, Light sources, Critical dimension metrology, Scanners, Control systems, Lithographic illumination

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Proceedings Article | 12 April 2013 Paper

High power 120W ArF immersion XLR laser system for high dose applications

R. Rokitski, R. Rafac, J. Melchior, R. Dubi, J. Thornes, T. Cacouris, M. Haviland, D. Brown

Proceedings Volume 8683, 86831H (2013) https://doi.org/10.1117/12.2012681

KEYWORDS: Light sources, Laser systems engineering, Semiconducting wafers, Optical lithography, Lithography, Time metrology, Deep ultraviolet, Amplifiers, Excimer lasers, Reliability

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Proceedings Article | 13 March 2012 Paper

Enhancing lithography process control through advanced, on-board beam parameter metrology for wafer level monitoring of light source parameters

Jinphil Choi, Nakgeuon Seong, Omar Zurita, Joshua Thornes, Yookeun Won, Slava Rokitski, Youngseog Kang, Bernd Burfeindt, Chanhoon Park

Proceedings Volume 8326, 83262O (2012) https://doi.org/10.1117/12.917900

KEYWORDS: Semiconducting wafers, Metrology, Light sources, Process control, Lithography, Critical dimension metrology, Light, Laser metrology, Optical lithography, Lithographic illumination

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Proceedings Article | 13 March 2012 Paper

Field performance availability improvements in lithography light sources using the iGLX Gas Management System

Kevin O'Brien, Daniel Riggs, Joshua Thornes, Nora Han, Amit Chakravorty, Paul Belitz

Proceedings Volume 8326, 83261O (2012) https://doi.org/10.1117/12.917594

KEYWORDS: Light sources, Lithography, Halogens, Control systems, Molybdenum, Gas lasers, Scanners, Semiconducting wafers, Computing systems, Complex systems

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Showing 5 of 12 publications

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