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Dr. Russell Teo
at Applied Materials Inc
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Author
Publications (1)
Proceedings Article | 20 April 2011 Paper
Scatterometry measurement for gate ADI and AEI critical dimension of 28-nm metal gate technology
Yu-Hao Huang, Howard Chen, Kyle Shen, H. H. Chen, Chun Chi Yu, J. H. Liao, Xiafang Zhang, Russell Teo, Zhi-Qing Xu, Sungchul Yoo, Ching-Hung Lin, Chao-Yu Cheng, Jason Lin
Proceedings Volume 7971, 79712O (2011) https://doi.org/10.1117/12.879480
KEYWORDS: Semiconducting wafers, Metals, Scatterometry, Single crystal X-ray diffraction, Transmission electron microscopy, Diffractive optical elements, Magnesium, Scatter measurement, Metrology, Critical dimension metrology
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