Mr. Sang-Hoon Han Profile

Sang-Hoon Han

Inspection Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (7)

Proceedings Article | 8 October 2014 Paper

Study of high sensitivity DUV inspection for sub-20nm devices with complex OPCs

Sang Hoon Han, Hong Yul Jung, Sun Pyo Lee, In-Yong Kang, Gi Sung Yoon, Dong Hoon Chung, Chan-Uk Jeon, Yulia Brand, Yair Eran, Yoad Bar-Shean, Alexander Chereshnya, Chung Ki Lyu

Proceedings Volume 9235, 92351K (2014) https://doi.org/10.1117/12.2076308

KEYWORDS: Inspection, SRAF, Photomasks, Artificial intelligence, Optical proximity correction, Evolutionary algorithms, Resolution enhancement technologies, Image resolution, Optical lithography, Source mask optimization

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Proceedings Article | 28 June 2013 Paper

Extending DUV mask inspection tool for inspecting 2xnm HP and beyond

Jihoon Na, Sang Hoon Han, Gisung Yoon, Dong Hoon Chung, Byung-Gook Kim, Chanuk Jeon, Dana Bernstein, Lior Shoval, Ido Dolev, Ofer Shopen, Ju Sang Lee, Chung ki Lyu, Seung Ryong Bae

Proceedings Volume 8701, 870115 (2013) https://doi.org/10.1117/12.2032774

KEYWORDS: Photomasks, Inspection, Printing, Deep ultraviolet, Signal to noise ratio, Defect detection, Semiconducting wafers, Optical inspection, Wafer-level optics, Geometrical optics

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Proceedings Article | 2 April 2011 Paper

Current status of EUV mask inspection using 193nm optical inspection system in 30nm node and beyond

Sang Hoon Han, Jihoon Na, Wonil Cho, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho, Dana Bernstein, Eun Young Park, Anoop Sreenath, Shmoolik Mangan

Proceedings Volume 7985, 79850V (2011) https://doi.org/10.1117/12.895209

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Signal to noise ratio, Optical inspection, Lithography, Scanners, Manufacturing, Semiconducting wafers

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Proceedings Article | 29 October 2010 Paper

Feasibility study of EUV patterned mask inspection for the 22nm node

Dana Bernstein, Eun Young Park, Asaf Jaffe, Nir Shoshani, Ziv Parizat, Shmoolik Mangan, Sang Hoon Han, Dong Hoon Chung

Proceedings Volume 7823, 782335 (2010) https://doi.org/10.1117/12.866155

KEYWORDS: Photomasks, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Image enhancement, Defect detection, Optical inspection, Deep ultraviolet, Signal detection, Semiconductors

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Proceedings Article | 23 September 2009 Paper

Inspection of complex OPC patterns for 4x node and beyond

Sang Hoon Han, Wonil Cho, Won-Sun Kim, Dong Hoon Chung, Chan-Uk Jeon, HanKu Cho

Proceedings Volume 7488, 74882S (2009) https://doi.org/10.1117/12.830032

KEYWORDS: Inspection, SRAF, Optical proximity correction, Artificial intelligence, Defect detection, Semiconducting wafers, Photomasks, Reticles, Model-based design, Image resolution

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Proceedings Article | 16 November 2007 Paper

Improving inspectability with KLA-Tencor TeraScan thin line de-sense

Chunlin Chen, David Kim, Ki Hun Park, NamWook Kim, Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung

Proceedings Volume 6730, 67303O (2007) https://doi.org/10.1117/12.747180

KEYWORDS: Inspection, SRAF, Photomasks, Semiconducting wafers, Optical proximity correction, Mask making, Electronics, Critical dimension metrology, Printing, Sensors

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Proceedings Article | 25 October 2007 Paper

A pragmatic approach to high sensitivity defect inspection in the presence of mask process variability

Sang Hoon Han, Jin Hyung Park, Dong Hoon Chung, Sang-Gyun Woo, Han Ku Cho, David Kim, Chunlin Chen, Ki-Hun Park, Gregg Inderhees

Proceedings Volume 6730, 673024 (2007) https://doi.org/10.1117/12.746567

KEYWORDS: Inspection, SRAF, Photomasks, Reticles, Optical proximity correction, Defect inspection, Databases, Opacity, Semiconducting wafers, Defect detection

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Showing 5 of 7 publications

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