Mr. Sangyouk Lee Profile

Sangyouk Lee

at Hanyang Univ

SPIE Involvement:

Author

Publications (1)

This will count as one of your downloads.

You will have access to both the presentation and article (if available).

DOWNLOAD NOW

This content is available for download via your institution's subscription. To access this item, please sign in to your personal account.

Email or Username Forgot your username?

Password Forgot your password?

Show

Keep me signed in

No SPIE account? Create an account

Proceedings Article | 24 March 2008 Paper

Ellipsometric inspection of the inner surface of pellicle-covered masks

Sangyouk Lee, Chulgi Song, Jusang Rhim, Hyoungjoo Lee, Jaisun Kyoung, Soobok Chin, Taehyuk Ahn, Ilsin An

Proceedings Volume 6922, 692227 (2008) https://doi.org/10.1117/12.772151

KEYWORDS: Pellicles, Photomasks, Phase modulation, Inspection, Air contamination, Crystals, Ellipsometry, Polarization, Ultraviolet radiation, Lithography

Read Abstract +

Crystal growth and haze formation on photomasks become serious problems in UV lithography. As the wavelength becomes shorter, photons carry more energy, so the chances of having a photochemical reaction become much higher. Pellicle, adhesive, residue from cleaning or resist strip process, and any contaminant in air can react with UV to form unwanted crystals and a haze layer on reticles. These will reduce the light transmission during exposure process. Thus, frequent mask inspection and periodic mask cleaning are needed to overcome these problems. However, these will in turn increase manufacturing cost and reduce mask life. Thus, a proper mask inspection tool is required to provide early warning of haze formation. In this work, we devised a new ellipsometric technique to investigate the inner surface of mask without removing pellicle. Ellipsometry is known to have mono-layer sensitivity and it can be used to measure any film or partial film formed on non-patterned spot in early stage of growth. However, when a pellicle covers the surface of mask, the ellipsometric data reflected from surface are extremely distorted due to the non-normal transmission through the pellicle. Thus, data analysis becomes extremely difficult without knowing the optical properties of pellicles. In order to solve this problem we developed compensation technique in which two blank pellicles are situated in the optical path in a way to compensate the polarization changes caused by the pellicle on mask. With this method, the conventional ellipsometry spectra of {Δ, Ψ} are deduced.

My Library

You currently do not have any folders to save your paper to! Create a new folder below.

Folder Name

Folder Description

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks. You are receiving this notice because your organization may not have SPIE eBooks access.*

*Shibboleth/Open Athens users─please sign in to access your institution's subscriptions.

To obtain this item, you may purchase the complete book in print or electronic format on SPIE.org.

ORGANIZATIONAL
Sign in with credentials provided by your organization.

Organizational Username

Organizational Password

Show/Hide Password

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members:

Non-members: ADD TO CART

Keywords/Phrases

Search In:

Publication Years