Dr. Sebastien P. Pochon
Senior Applications Engineer at Oxford Instruments Plasma Technology Ltd
SPIE Involvement:
Author
Publications (7)

Proceedings Article | 12 March 2024 Poster + Paper
Proceedings Volume 12913, 129131A (2024) https://doi.org/10.1117/12.3000170
KEYWORDS: Atomic force microscopy, Diffraction gratings, Ion beams, Etching, Plasma, Equipment, Silicon, Semiconducting wafers, Scanning electron microscopy

Proceedings Article | 29 March 2021 Presentation + Paper
Martin Eibelhuber, Christine Thanner, Dominik Treiblmayr, Sebastien Pochon, W. Frost, Joao Ferreira, David Pearson, Stephanie Baclet
Proceedings Volume 11765, 117650H (2021) https://doi.org/10.1117/12.2579505
KEYWORDS: Refractive index, Augmented reality, Waveguides, Nanoimprint lithography, Etching, Polymers, Glasses, Nanostructures, Photorefractive polymers, Optics manufacturing

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10589, 105890P (2018) https://doi.org/10.1117/12.2301007
KEYWORDS: Etching, Argon, Ion beams, Ions, Chlorine, Plasma, Reactive ion etching, Photoresist materials, Photomasks, Aluminum

Proceedings Article | 19 September 2016 Paper
P. Alvarez, D. I. Pearson, S. Pochon, O. Thomas, M. Cooke, R. Gunn
Proceedings Volume 9974, 997415 (2016) https://doi.org/10.1117/12.2248262
KEYWORDS: Oxidation, Resistance, Vanadium, Oxides, Ion beams, Sputter deposition, Thin film deposition, Thin films, Oxygen, Semiconducting wafers

Proceedings Article | 26 September 2013 Paper
Proceedings Volume 8816, 88161K (2013) https://doi.org/10.1117/12.2025534
KEYWORDS: Contamination, Ion beams, Sputter deposition, Ions, Argon, Etching, Silica, Metals, Xenon, Thin films

Showing 5 of 7 publications
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