CONFERENCE PROCEEDINGS
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Shao-Wen Chang
at Taiwan Semiconductor Manufacturing Co Ltd
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Publications (3)
SPIE Journal Paper | 3 June 2016
Characterization of charging-induced pattern positioning errors in advanced mask making
Chien-Cheng Chen, Yen-Cheng Ho, Shao-Wen Chang, Chia-Jen Chen, Ta-Cheng Lien, Chih-Cheng Lin, Hsin-Chang Lee, Anthony Yen
JM3, Vol. 15, Issue 02, 021409, (June 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021409
KEYWORDS: Photomasks, Image registration, Mask making, Palladium, Monte Carlo methods, Quartz, Model-based design, Scattering, Electron beam lithography, Holmium
Proceedings Article | 28 October 2015 Paper
Quantitative analysis of CD degradation induced by the fogging effect in e-beam lithography
Shao-Wen Chang, Tzu-Yi Wang, Ta-Cheng Lien, Chia-Jen Chen, Chih-Cheng Lin, Sin-Chang Lee, Anthony Yen
Proceedings Volume 9635, 96350I (2015) https://doi.org/10.1117/12.2197838
KEYWORDS: Photomasks, Critical dimension metrology, Electron beam lithography, Forward error correction, Modulation, Quantitative analysis, Etching, Mask making, Electron beams, Objectives
Proceedings Article | 23 October 2015 Paper
Exploring the origin of charging-induced pattern positioning errors in mask making using e-beam lithography
Chien-Cheng Chen, Tzu-Ling Liu, Shao-Wen Chang, Yen-Cheng Ho, Chia-Jen Chen, Chih-Cheng Lin, Ta-Cheng Lien, Hsin-Chang Lee, Anthony Yen
Proceedings Volume 9635, 963508 (2015) https://doi.org/10.1117/12.2200961
KEYWORDS: Image registration, Photomasks, Mask making, Electron beam lithography, Optical lithography, Electrons, Quartz, Pellicles, Scattering, Etching
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