Dr. Soohong Kim
at Siemens EDA
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 16 September 2022 Paper
Proceedings Volume 12325, 1232507 (2022) https://doi.org/10.1117/12.2641214
KEYWORDS: Optical proximity correction, Photomasks, Electronic design automation, Resolution enhancement technologies, SRAF, Data storage, Semiconducting wafers, Scattering

Proceedings Article | 12 October 2021 Presentation + Paper
Apurva Bajpai, Rachit Sharma, Amanda Bowhill, Stephen Kim, Soohong Kim
Proceedings Volume 11855, 118550V (2021) https://doi.org/10.1117/12.2601100
KEYWORDS: Data processing, Photomasks, Semiconductor manufacturing, Parallel processing

Proceedings Article | 20 March 2018 Presentation + Paper
Proceedings Volume 10587, 105870R (2018) https://doi.org/10.1117/12.2297240
KEYWORDS: Optical proximity correction, Photomasks, Data processing, Resolution enhancement technologies, SRAF, Computing systems, Parallel processing, Integrated circuits, Design for manufacturability

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