Prof. Stella W. Pang Profile

Prof. Stella W. Pang

at City Univ Of Hong Kong

SPIE Involvement:

Author | Instructor

Proceedings Article | 2 August 2021 Presentation

Nanoimprinted three-dimensional plasmonic sensors with high sensitivity

Stella Pang

Proceedings Volume 11828, 1182803 (2021) https://doi.org/10.1117/12.2597188

KEYWORDS: Plasmonic sensors, Nanostructures, Nanoplasmonics, Sensors, Plasmonics, Photonic crystals, Metals, Surface plasmons, Sensor technology, Sensor performance

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SPIE Journal Paper | 1 January 2006

Pattern fidelity in nanoimprinted films using critical dimension small angle x-ray scattering

Ronald Jones, Christopher Soles, Eric Lin, Wenchuang Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana

JM3, Vol. 5, Issue 01, 013001, (January 2006) https://doi.org/10.1117/12.10.1117/1.2170550

KEYWORDS: Nanoimprint lithography, Data modeling, Polymers, Polymethylmethacrylate, X-rays, Scattering, Scanning electron microscopy, Diffraction, Picosecond phenomena, Silicon

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Proceedings Article | 6 May 2005 Paper

Pattern fidelity in nanoimprinted films using CD-SAXS

Ronald Jones, Christopher Soles, Eric Lin, Walter Hu, Ronald Reano, Stella Pang, Steven Weigand, Denis Keane, John Quintana

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600267

KEYWORDS: Nanoimprint lithography, Polymers, Polymethylmethacrylate, Data modeling, Scanning electron microscopy, X-rays, Photoresist materials, Diffraction, Silicon, Picosecond phenomena

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Proceedings Article | 20 May 2004 Paper

Plasticizer-assisted polymer imprint and transfer

Li Tan, Yen Peng Kong, Stella Pang, Albert Yee

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.534290

KEYWORDS: Polymers, Nanoimprint lithography, Silicon, Polymer thin films, Optical lithography, Semiconducting wafers, Printing, Lithography, Reactive ion etching, Atomic force microscopy

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Proceedings Article | 31 August 1998 Paper

High-aspect-ratio single-crystal Si microelectromechanical systems

Jason Weigold, Stella Pang

Proceedings Volume 3511, (1998) https://doi.org/10.1117/12.324307

KEYWORDS: Silicon, Resonators, Etching, Crystals, Semiconducting wafers, Dry etching, Signal processing, Nickel, Amplifiers, Integrated circuits

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Proceedings Article | 29 June 1998 Paper

Novel approach to surface imaging

Mark Spak, Fred Mohr, Ronald Bradbury, Ralph Dammel, Jason Weigold, Stella Pang

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312387

KEYWORDS: Etching, Image processing, Photoresist materials, Plasma, Ions, Lithography, Plasma etching, Liquids, Antireflective coatings, Imaging systems

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Proceedings Article | 5 September 1997 Paper

Optical interferometric characterization of membrane curvature in boron-doped Si microstructures

Jason Weigold, Wen Han Juan, Stella Pang, Jeffrey Borenstein

Proceedings Volume 3223, (1997) https://doi.org/10.1117/12.284474

KEYWORDS: Silicon, Diffusion, Interferometry, Semiconducting wafers, Optical interferometry

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Proceedings Article | 23 September 1996 Paper

Dry etching and boron diffusion of heavily doped high-aspect ratio Si trenches

Wen Han Juan, Jason Weigold, Stella Pang

Proceedings Volume 2879, (1996) https://doi.org/10.1117/12.251222

KEYWORDS: Silicon, Diffusion, Etching, Microwave radiation, Doping, Dry etching, Boron, High aspect ratio silicon micromachining, Semiconducting wafers, Chlorine

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Proceedings Article | 19 September 1995 Paper

Dry micromachining of high-aspect-ratio Si for microsensors

Stella Pang

Proceedings Volume 2639, (1995) https://doi.org/10.1117/12.221280

KEYWORDS: Silicon, Etching, Diffusion, High aspect ratio silicon micromachining, Dry etching, Ions, Microwave radiation, Microsensors, Photomasks, Micromachining

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Proceedings Article | 26 May 1994 Paper

Photoreflectance study of the chemically modified (100) GaAs surface

Orest Glembocki, Judah Ari Tuchman, K. Ko, Stella Pang, John Dagata, Adriana Giordana, R. Kaplan, Charles Stutz

Proceedings Volume 2141, (1994) https://doi.org/10.1117/12.176843

KEYWORDS: Gallium arsenide, Etching, Oxides, Gallium, Spectroscopy, Interfaces, Solar energy, Ions, Arsenic, Electrons

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Proceedings Article | 21 May 1993 Paper

Planarization film by plasma-enhanced chemical vapor deposition and low-temperature oxide as conformal insulator

Stella Pang

Proceedings Volume 1805, (1993) https://doi.org/10.1117/12.145462

KEYWORDS: Oxides, Plasma, Gases, Plasma enhanced chemical vapor deposition, Silicon, Microwave radiation, Refractive index, Ions, Annealing, Oxidation

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Proceedings Article | 1 September 1991 Paper

Integration of a coherent optical receiver with adaptive image rejection capability

Gerard Lachs, Syed Zaidi, Amit Singh, Rudolf Henning, Dominick Trascritti, H. Kim, Pallab Bhattacharya, Jagadeesh Pamulapati, P. McCleer, George Haddad, Stella Pang

Proceedings Volume 1474, (1991) https://doi.org/10.1117/12.44929

KEYWORDS: Sensors, Field effect transistors, Receivers, Microwave radiation, Cladding, Diodes, Waveguides, Photonic integrated circuits, Integrated optics, Gallium arsenide

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Proceedings Article | 1 March 1991 Paper

Enhanced etching of InP by cycling with sputter etching and reactive ion etching

Alexandros Demos, H. Fogler, Stella Pang, Michael Elta

Proceedings Volume 1392, (1991) https://doi.org/10.1117/12.48924

KEYWORDS: Etching, Reactive ion etching, Indium, Semiconducting wafers, Photomasks, Chlorine, Photoresist materials, Ions, Plasmas, Integrated circuits

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Proceedings Article | 1 August 1990 Paper

High-speed resonant-tunneling diodes made from the In0.53Ga0.47As/AlAs material system

Elliott Brown, C. Parker, Arthur Calawa, M. Manfra, T. Sollner, Chang Chen, Stella Pang, K. Molvar

Proceedings Volume 1288, (1990) https://doi.org/10.1117/12.20913

KEYWORDS: Diodes, Oscillators, Switching, Picosecond phenomena, Resistance, Gallium arsenide, Switches, Capacitance, High speed electronics, Indium gallium arsenide

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Showing 5 of 14 publications

SPIE Conference Volume | 5 September 1997

Micromachining and Microfabrication Process Technology III

SPIE Conference Volume | 23 September 1996

Micromachining and Microfabrication Process Technology II

Conference Committee Involvement (4)

Nanofabrication Technologies

3 August 2003 | San Diego, California, United States

Micromachining and Microfabrication Process Technology VIII

27 January 2003 | San Jose, CA, United States

Micromachining and Microfabrication Process Technology III

29 September 1997 | Austin, TX, United States

Micromachining and Microfabrication Process Technology II

14 October 1996 | Austin, TX, United States

Course Instructor

SC305: Microfabrication Technology for Micro-electromechanical Systems

In this short course, various microfabrication technologies for MEMS are introduced. Process design, precise dimension control, integrating mechanical and electrical components are covered. Current technology trends for MEMS with examples in mechanical, optical, and chemical sensing and actuation are given. New development of MEMS technology in the future is addressed.

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SC535: Microfabrication Technology for Micro-ElectroMechanical Systems

In this short course, various microfabrication technologies for MEMS will be introduced. Process design and factors for precise dimension control for MEMS will be covered. Issues related to integrating mechanical and electrical components will be discussed. Current technology trends for MEMS with examples in mechanical, optical and chemical sensing and actuation will be given. New development of MEMS technology in the future will be addressed. The specific topics covered are: patterning by optical, x-ray and focused ion beam lithography; selective wet-etching processes; directional dry-etching processes; thin-film deposition by evaporation, sputtering, electroplating, chemical vapor deposition and laser-assisted deposition; new materials for MEMS; bonding and release of mechanical structures; packaging and circuit integration; MEMS technology for mechanical, optical, and chemical sensors.

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