Exposure tools for 193nm lithography are expected to use Argon-Fluoride lasers at repetition rates of at least 2kHz. We are showing that, by revisiting several key technologies, the performance and reliability of ArF lasers at 2 kHz are trending towards a level comparable to KrF lasers.
A powerful method for analyzing focus crosstalk in pregroove systems is presented. Effects of specific wavefront aberrations and misalignments can be seen in a single picture.
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