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Stilian Pandev
Director Advanced Algorithms at KLA Corp
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Author
Publications (5)
Proceedings Article | 27 April 2023 Poster + Paper
Mueller matrix spectroscopy and physics-based machine learning for gate-all-around sheet-specific metrology
Houssam Chouaib, Anderson Chou, Valeria Dimastrodonato, Shawn Lin, Ben Hsieh, HaoMiao Chang, James Chuang, Brooks Hsiao, Stilian Pandev, Zhengquan Tan, Derrick Shaughnessy
Proceedings Volume 12496, 124962V (2023) https://doi.org/10.1117/12.2658085
KEYWORDS: Education and training, Gallium arsenide, Metrology, Nanosheets, Data modeling, Etching, Silicon, 3D modeling, Mueller matrices, Scatterometry
Proceedings Article | 13 March 2018 Presentation + Paper
In-cell overlay metrology by using optical metrology tool
Proceedings Volume 10585, 105851D (2018) https://doi.org/10.1117/12.2300946
KEYWORDS: Semiconducting wafers, Overlay metrology, Model-based design, Metrology, Diffractive optical elements, Etching, Process modeling, Process control, Optical imaging, Optical metrology
Proceedings Article | 28 March 2017 Paper
SAQP pitch walk metrology using single target metrology
Fang Fang, Pedro Herrera, Taher Kagalwala, Janay Camp, Alok Vaid, Stilian Pandev, Franz Zach
Proceedings Volume 10145, 101452R (2017) https://doi.org/10.1117/12.2261620
KEYWORDS: Metrology, Process control, Critical dimension metrology, Scatterometry, Optical lithography, Scanning electron microscopy, Scanners, Lithography, Etching, Semiconducting wafers, Diffractive optical elements
Proceedings Article | 24 March 2016 Paper
Improving OCD time to solution using Signal Response Metrology
Fang Fang, Xiaoxiao Zhang, Alok Vaid, Stilian Pandev, Dimitry Sanko, Vidya Ramanathan, Kartik Venkataraman, Ronny Haupt
Proceedings Volume 9778, 977806 (2016) https://doi.org/10.1117/12.2219775
KEYWORDS: Metrology, Optical metrology, Critical dimension metrology, Measurement devices, Time metrology, Lithography, Etching, Semiconducting wafers, Instrument modeling, Transistors, Model-based design, Signal processing, Scatterometry, Scanners, Data modeling, Control systems
Proceedings Article | 19 March 2015 Paper
Signal response metrology (SRM): a new approach for lithography metrology
Stilian Pandev, Fang Fang, Young Ki Kim, Jamie Tsai, Alok Vaid, Lokesh Subramany, Dimitry Sanko, Vidya Ramanathan, Ren Zhou, Kartik Venkataraman, Ronny Haupt
Proceedings Volume 9424, 94241P (2015) https://doi.org/10.1117/12.2086056
KEYWORDS: Semiconducting wafers, Metrology, Finite element methods, Critical dimension metrology, Scanners, Single crystal X-ray diffraction, Scatterometry, Model-based design, Data modeling, Lithography
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