Mr. Susan Zollinger Profile

Susan Zollinger

at Applied Materials, Inc.

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Publications (1)

Proceedings Article | 13 June 2022 Presentation

Resist shrink characterization methodology for more accurate CD metrology

Mary Breton, Karen Petrillo, Jennifer Church, Luciana Meli, Jennifer Fullam, Stuart Sieg, Romain Lallement, Nelson Felix, Shimon Levi, Susan Zollinger, Felix Levitov, Sean Hand, Jason Osborne, Weijie Wang

Proceedings Volume PC12053, PC120530C (2022) https://doi.org/10.1117/12.2614219

KEYWORDS: Critical dimension metrology, Metrology, Scanning electron microscopy, Photoresist materials, Optical proximity correction, Process modeling, Data modeling, Photomasks, Lithography, Extreme ultraviolet lithography

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