Mr. Sven Ploeger Profile

Sven Ploeger

at HOLOEYE Photonics AG

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Author

Publications (8)

Proceedings Article | 27 April 2016 Paper

Precision glass molding of high-resolution diffractive optical elements

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9888, 98880U (2016) https://doi.org/10.1117/12.2228873

KEYWORDS: Fabrication, Carbon, Lithography, Electron beam lithography, Diffraction, Beam splitters, Diffractive optical elements, Silica, Etching, Glasses, Silicon, Scanning electron microscopy, Micro optics, Optical resolution, Photomasks, Integrated optics, Reactive ion etching, Precision glass molding

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Proceedings Article | 24 September 2015 Paper

Multilevel micro-structuring of glassy carbon molds for precision glass molding

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Peter Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9628, 96281M (2015) https://doi.org/10.1117/12.2191661

KEYWORDS: Carbon, Beam splitters, Diffractive optical elements, Etching, Glasses, Silicon, Optical fabrication, Reactive ion etching, Semiconducting wafers, Precision glass molding

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Proceedings Article | 13 March 2015 Paper

Multilevel micro-structuring of glassy carbon for precision glass molding of diffractive optical elements

Karin Prater, Julia Dukwen, Toralf Scharf, Hans Peter Herzig, Sven Plöger, Andreas Hermerschmidt

Proceedings Volume 9374, 937410 (2015) https://doi.org/10.1117/12.2080762

KEYWORDS: Carbon, Titanium, Diffractive optical elements, Silica, Etching, Glasses, Photomasks, Reactive ion etching, Power meters, Precision glass molding

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Proceedings Article | 20 May 2009 Paper

Microdisplays in holographic mastering applications

Sven Plöger, Sven Krüger, Stefan Osten, Günther K. Wernicke, Gerhard Ackermann, Jürgen Eichler

Proceedings Volume 7358, 73581H (2009) https://doi.org/10.1117/12.823474

KEYWORDS: Holograms, Holography, 3D image reconstruction, Image processing, Image resolution, Phase shift keying, Computer generated holography, Image transmission, Information security, Holography applications

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Proceedings Article | 21 March 2007 Paper

Polarization dependence of multilayer reflectance in the EUV spectral range

Frank Scholze, Christian Laubis, Christian Buchholz, Andreas Fischer, Annett Kampe, Sven Plöger, Frank Scholz, Gerhard Ulm

Proceedings Volume 6517, 65172W (2007) https://doi.org/10.1117/12.707867

KEYWORDS: Mirrors, Multilayers, Polarization, Sensors, Reflectivity, Polarimetry, Reflectometry, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography

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Proceedings Article | 24 March 2006 Paper

Polarization dependence of multilayer reflectance in the EUV spectral range

Frank Scholze, Christian Laubis, Christian Buchholz, Andreas Fischer, Sven Plöger, Frank Scholz, Gerhard Ulm

Proceedings Volume 6151, 615137 (2006) https://doi.org/10.1117/12.656277

KEYWORDS: Multilayers, Metrology, Polarization, Sensors, Reflectivity, Reflectometry, Diodes, Extreme ultraviolet, Extreme ultraviolet lithography, EUV optics

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Proceedings Article | 23 March 2006 Paper

Characterization of large off-axis EUV mirrors with high accuracy reflectometry at PTB

Christian Laubis, Christian Buchholz, Andreas Fischer, Sven Plöger, Frank Scholz, Heike Wagner, Frank Scholze, Gerhard Ulm, Hartmut Enkisch, Stephan Müllender, Marco Wedowski, Eric Louis, Erwin Zoethout

Proceedings Volume 6151, 61510I (2006) https://doi.org/10.1117/12.656246

KEYWORDS: Mirrors, Multilayers, Sensors, Coating, Reflectivity, Reflectometry, Extreme ultraviolet, Extreme ultraviolet lithography, Off axis mirrors, EUV optics

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CZ SMT AG produced large off-axis EUV mirrors as they are used e.g. in ASML's alpha demo tools, the predecessor for Extreme Ultraviolet Lithography (EUVL) production tools by ASML. The coating development and a large part of the actual coatings were done by the FOM-Institute. The Physikalisch-Technische Bundesanstalt (PTB) operates an EUV reflectometry facility at the electron storage ring BESSY II for at-wavelength metrology of full-size EUVL optics with a weight of up to 50 kg and a diameter of 550 mm. Critical issues for EUVL mirrors are the high reflectivity close to the theoretical limit, the matching of the period to the operating wavelength of the stepper (13.5 nm) and the imaging properties of the EUV optics. The full multilayer stack needs to be controlled laterally to such extend that the initial sub-nanometre surface figure of the substrate is preserved. The so-called added figure error should not exceed 100 pm in order to ensure faultless imaging at 13.5 nm wavelength. Here, we discuss representative results obtained at large off-axis EUV mirrors. We especially discuss the challenges of measurements at higher local angles of incidence according to the optical design and the accuracy needed in sample alignment for measurement of the coating profiles. PTB has shown excellent reproducibility for measurements of the near normal incidence reflectance of flat homogeneous mirrors over several years. For large off-axis EUV mirrors, measurements have to be done at angles significantly off normal, which dramatically increases the influence of angular alignment errors of the sample on the measured peak wavelength. Furthermore, according to the optical design, these optics have gradients of the coating thickness which require exact knowledge of the measurement position in the mirror coordinates. Extensive studies were done to estimate and validate the uncertainties connected to the sample alignment. Our results clearly show that it is possible to meet and verify the tight specifications for the lateral coating profiles of EUV multilayer mirrors. The non-correctable added figure error is significantly better than required and the overall reflectance of the coatings with a special protective capping layer is 65%.

Proceedings Article | 6 May 2005 Paper

Status of EUV reflectometry at PTB

Frank Scholze, Christian Laubis, Christian Buchholz, Andreas Fischer, Sven Ploeger, Frank Scholz, Heike Wagner, Gerhard Ulm

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.598728

KEYWORDS: Mirrors, Multilayers, Metrology, Sensors, Reflectivity, Reflectometry, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Temperature metrology

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