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Taigo Fujii
at Nippon Control System Corp
SPIE Involvement:
Author
Publications (3)
Proceedings Article | 21 November 2023 Presentation + Paper
Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
Ai Kaneko, Taigo Fujii, Itaru Ono, Ahmad Syukri, Yohei Torigoe, Mincheol Kim, Sukho Lee, Eok Bong Kim, Sanghee Lee
Proceedings Volume 12751, 127510U (2023) https://doi.org/10.1117/12.2686942
KEYWORDS: Printing, Optical proximity correction, Photomasks, Lithography, Industry, Electromagnetic simulation, Deformation
Proceedings Article | 29 September 2023 Paper
New multi-beam mask data preparation method for EUV high volume data
Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji
Proceedings Volume 12915, 129150D (2023) https://doi.org/10.1117/12.2683168
KEYWORDS: Extreme ultraviolet, Design and modelling, Electronic design automation, Algorithm development, Mathematical optimization, Data conversion, Product engineering, Optical proximity correction, Nanofabrication, Lithography
Proceedings Article | 12 October 2021 Presentation + Paper
File formats for curvilinear multi-beam writing of 193i and EUV masks
Christof Zillner, Amir Moqanaki, Harald Höller, Elmar Platzgummer, Masakazu Hamaji, Taigo Fujii
Proceedings Volume 11855, 1185512 (2021) https://doi.org/10.1117/12.2602375
KEYWORDS: Photomasks, Extreme ultraviolet, Information technology, Data processing, Data conversion, Data storage, Extreme ultraviolet lithography, Data corrections
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