Tetsumasa Takaichi
at Merck Electronics Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 10 April 2024 Presentation
Masato Suzuki, Rikio Kozaki, Yida Liu, Tetsumasa Takaichi, Toshiya Okamura, YoungJin Kim, YoungJun Her, Hengpeng Wu, Kun Si, Chenyang Ma, Mark Maturi, Philipp Fackler, Mansour Moinpour, Ralph Dammel, Yi Cao
Proceedings Volume 12957, 129570T (2024) https://doi.org/10.1117/12.3012914
KEYWORDS: Photoresist materials, Line width roughness, Extreme ultraviolet lithography, Industry, Thermal stability, Process control, Printing, Polymers, Industrial applications, Film thickness

SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top